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STE32NK80Z

STMicroelectronics

STE32NK80Z by STMicroelectronics

STE32NK80Z by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a max drain current of 32 A, breakdown voltage of 800 V, and operates at up to 150 °C. Ideal for high-power circuits with built-in diode functionality.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,694 parts In-Stock

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4,694

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Digiode

USA . 4,145 parts In-Stock

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4,145

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Anansix

USA . 329 parts In-Stock

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329

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,551 parts In-Stock

1+ parts

$1.357

100+ parts

-

1k+ parts

$1.221

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1,551

$1.357

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$1.221

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MKK Technologies

India . 295 parts In-Stock

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$2.552

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295

$2.552

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DigiPath Technology Company

USA . 295 parts In-Stock

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$2.552

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295

$2.552

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Corphita

USA . 3,024 parts In-Stock

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3,024

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Parana Technologies

USA . 512 parts In-Stock

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$1.622

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512

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$1.622

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Overview

Unlock unparalleled efficiency with the STE32NK80Z from STMicroelectronics, a leader in innovative semiconductor solutions. This high-performance N-channel power FET is engineered for seamless switching applications, delivering exceptional reliability and durability. With its robust design and built-in diode, it excels in demanding environments, empowering your projects with enhanced performance and energy savings, making it the ideal choice for industrial automation and renewable energy systems. Experience the STMicroelectronics advantage today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy offers excellent durability and cost-effectiveness, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient and have better performance in terms of switching speeds and power handling.

Configuration: SINGLE WITH BUILT-IN DIODE

A built-in diode enhances the functionality by providing reverse polarity protection, adding to the reliability of the device.

Transistor Application: SWITCHING

Designed for switching purposes, this transistor can handle rapid on-off states, making it ideal for power management in circuits.

Minimum DS Breakdown Voltage: 800 V

A high breakdown voltage ensures robustness in high-voltage applications, making this FET reliable and versatile.

Package Shape: RECTANGULAR

The rectangular shape facilitates efficient heat dissipation and easier mounting in various electronic configurations.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows the FET to operate efficiently with lower gate voltages and reduces power consumption.

Maximum Pulsed Drain Current (IDM): 128 A

The high pulsed drain current capability allows the FET to handle short bursts of high currents, suitable for demanding applications.

No. of Terminals: 4

Four terminals provide versatility in connection configurations, allowing for more complex circuit designs.

Package Style (Meter): FLANGE MOUNT

Flange mounting offers secure installation and better thermal management in static applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures low gate drive power requirements and high-speed operation, ideal for modern electronic circuits.

Maximum Operating Temperature: 150 °C

A higher operating temperature tolerance means this FET can function in a wider range of environmental conditions.

Transistor Element Material: SILICON

Silicon as a base material offers excellent conductivity and efficiency, making it a standard choice in FET applications.

Maximum Drain Current (ID): 32 A

With a maximum drain current of 32 A, this FET is capable of handling significant loads, suitable for power applications.

Maximum Drain-Source On Resistance: 0.24 ohm

Low on-resistance reduces power losses during operation, enhancing efficiency and maximizing performance.

Terminal Position: UPPER

Upper terminal positioning allows for easy accessibility and simplifies the integration into various circuit designs.

Case Connection: ISOLATED

Isolated case connection ensures safety and reduces the risk of short-circuits in sensitive applications.

Technical Specifications

Power Field Effect Transistors (FET) STE32NK80Z attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

800 V

Maximum Drain Current (ID):

32 A

Maximum Drain-Source On Resistance:

.24 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PUFM-X4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

128 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Form:

UNSPECIFIED

Terminal Position:

UPPER

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STE32NK80Z Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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