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STE38N60

STMicroelectronics

STE38N60 by STMicroelectronics

STE38N60 from STMicroelectronics is a powerful N-channel FET designed for switching applications, featuring a 600V breakdown voltage and max drain current of 38A. It offers high efficiency with a low on-resistance of 0.15Ω and can dissipate up to 450W. Ideal for high-temperature environments, it operates effectively at up to 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 3,963 parts In-Stock

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Anansix

USA . 2,733 parts In-Stock

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2,733

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Digiode

USA . 2,467 parts In-Stock

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2,467

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J & M Industries LLC

USA . 333 parts In-Stock

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ECAB

Sweden . 5 parts In-Stock

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5

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IDEA Electronic Components Group

UK . 2,123 parts In-Stock

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$0.822

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$0.739

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2,123

$0.822

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$0.739

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MKK Technologies

India . 183 parts In-Stock

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$1.545

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183

$1.545

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DigiPath Technology Company

USA . 183 parts In-Stock

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$1.545

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183

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Corphita

USA . 1,822 parts In-Stock

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Kepictronics

USA . 564 parts In-Stock

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564

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Parana Technologies

USA . 328 parts In-Stock

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$0.982

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328

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$0.982

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Overview

Unlock superior performance with the STE38N60 from STMicroelectronics, a trusted leader in innovative semiconductor solutions. This N-channel Power FET excels in switching applications, delivering exceptional reliability and efficiency for demanding environments. With robust capabilities like high breakdown voltage and impressive current handling, it’s ideal for power management in industrial and automotive systems. Choose STE38N60 to elevate your projects with unparalleled value and cutting-edge technology!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy ensures a lightweight and durable package, contributing to the overall reliability of the product.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher efficiency and faster switching speeds, making them suitable for a wide range of applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional functionality and protection, enhancing performance in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET delivers optimal performance in controlling power efficiently.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage allows this FET to be used in a variety of high-voltage applications, increasing its versatility.

Package Shape: RECTANGULAR

The rectangular shape facilitates easier integration into circuit designs and more efficient use of PCB space.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides better control over the transistor's conductivity, leading to improved performance.

Maximum Pulsed Drain Current (IDM): 152 A

The ability to handle high pulsed currents makes this FET suitable for applications where high current surges are common.

Maximum Drain Current (Abs) (ID): 38 A

A high maximum drain current rating allows this FET to manage substantial loads, making it ideal for high-power applications.

No. of Terminals: 4

The four-terminal design provides flexibility in circuit configurations and simplifies connections for various applications.

Maximum Power Dissipation (Abs): 450 W

A high power dissipation capability ensures reliable performance in demanding environments without overheating.

Package Style (Meter): FLANGE MOUNT

Flange mount designs promote secure attachment, making the FET suitable for applications with space and thermal management concerns.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology contributes to lower power consumption and higher efficiency, making it highly suitable for modern electronic systems.

Maximum Operating Temperature: 150 °C

A high operating temperature rating broadens the scope of applications, particularly in harsh environments.

Transistor Element Material: SILICON

Silicon is a proven material that offers reliable performance, thermal stability, and affordability for FET applications.

Maximum Drain Current (ID): 38 A

Reiterating the substantial current handling capacity emphasizes the FET's suitability for high-power applications.

Maximum Drain-Source On Resistance: 0.15 ohm

Low on-resistance minimizes power losses during operation, enhancing efficiency and overall system performance.

Terminal Position: UPPER

Upper terminal positioning can simplify layout and design considerations in diverse circuit applications.

Case Connection: ISOLATED

Isolated case connections enhance safety and reliability, particularly in sensitive applications where short circuits are a concern.

Reference Standard: UL RECOGNIZED

UL recognition confirms that this FET meets stringent safety standards, providing peace of mind for use in various applications.

Technical Specifications

Power Field Effect Transistors (FET) STE38N60 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

38 A

Maximum Drain Current (ID):

38 A

Maximum Drain-Source On Resistance:

.15 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PUFM-X4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

152 A

Qualification:

Not Qualified

Reference Standard:

UL RECOGNIZED

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

UNSPECIFIED

Terminal Position:

UPPER

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STE38N60 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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