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STD5NK52ZD

STMicroelectronics

STD5NK52ZD by STMicroelectronics

STD5NK52ZD by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 4.4 A, a breakdown voltage of 520 V, and operates at up to 150 °C. Ideal for power management in compact electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Digiode

USA . 3,984 parts In-Stock

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3,984

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Vyrian

USA . 2,025 parts In-Stock

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2,025

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Anansix

USA . 481 parts In-Stock

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481

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IDEA Electronic Components Group

UK . 2,295 parts In-Stock

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$1.415

100+ parts

-

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$1.273

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2,295

$1.415

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$1.273

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MKK Technologies

India . 773 parts In-Stock

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$2.661

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773

$2.661

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DigiPath Technology Company

USA . 773 parts In-Stock

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$2.661

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773

$2.661

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AZTECH Wire

Italy . 194 parts In-Stock

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$21.510

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194

$21.510

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Component Stockers USA

USA . 795 parts In-Stock

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$99.990

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795

$99.990

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A-Z Elektronik GmbH

Germany . 7,076 parts In-Stock

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7,076

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Alle Elektronik GmbH

Germany . 3,286 parts In-Stock

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Corphita

USA . 2,213 parts In-Stock

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Parana Technologies

USA . 1,629 parts In-Stock

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$1.692

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$1.692

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Kepictronics

USA . 1,000 parts In-Stock

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Overview

Elevate your designs with the STD5NK52ZD from STMicroelectronics—a powerhouse in the realm of N-channel power FETs. Known for their unwavering quality and innovation, STMicroelectronics delivers unmatched reliability and performance. This versatile component excels in switching applications, ensuring efficient energy management while boasting robust temperature resilience. Experience superior value and benefits that empower your projects to achieve exceptional results, all backed by a trusted manufacturer.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material provides excellent mechanical strength and environmental protection, making the FET durable and reliable in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically offer higher efficiency and better performance in switching applications, making them ideal for power management.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances circuit design flexibility and protects against reverse polarity, improving overall reliability in applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently manage power loads, making it suitable for various electronic devices.

Surface Mount: YES

Surface mount technology enables compact designs, making it easier to integrate into high-density circuits and improves thermal performance.

Minimum DS Breakdown Voltage: 520 V

A high breakdown voltage allows the FET to operate safely in demanding conditions, ensuring longevity in high-voltage applications.

Package Shape: RECTANGULAR

The rectangular package shape is optimized for PCB layout, simplifying design processes and enhancing space utilization.

Terminal Form: GULL WING

Gull wing terminals provide superior solderability and mechanical strength, ensuring reliable performance in a variety of applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low gate-source voltage applications, delivering efficient switching performance.

Maximum Pulsed Drain Current (IDM): 17.6 A

This high pulsed current capability allows for handling significant surges, making the FET suitable for peak load applications.

Avalanche Energy Rating (EAS): 170 mJ

A robust avalanche energy rating indicates that this FET can withstand transient conditions, enhancing reliability in real-world applications.

Maximum Drain Current (Abs) (ID): 4.4 A

The maximum absorptive drain current supports steady-state operation, making the FET suitable for sustained applications.

No. of Terminals: 2

With only two terminals, this design simplifies integration into circuits and reduces possible points of failure.

Maximum Power Dissipation (Abs): 70 W

High power dissipation capability allows for better thermal management in high-performance applications, promoting device stability.

Package Style (Meter): SMALL OUTLINE

The small outline package style minimizes footprint, making it suitable for space-constrained applications without compromising performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology ensures low on-resistance and fast switching speeds, improving overall efficiency and performance in applications.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature enables the FET to function effectively even in challenging thermal environments.

Transistor Element Material: SILICON

Silicon is widely used in power electronics, offering excellent electrical characteristics and reliability.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish improves soldering quality and reduces oxidation risk, ensuring long-lasting electrical connections.

Maximum Drain-Source On Resistance: 1.5 ohm

Low on-resistance enhances efficiency by minimizing power loss during operation, making it ideal for power applications.

Terminal Position: SINGLE

Single terminal positioning simplifies the layout and integration process, which can be beneficial in compact designs.

Maximum Time At Peak Reflow Temperature (s): 30

This specification ensures that the FET can withstand typical reflow process conditions, promoting compatibility with automated assembly.

Peak Reflow Temperature °C: 260

High peak reflow temperature accommodates lead-free soldering processes, essential for modern manufacturing practices and environmental standards.

Technical Specifications

Power Field Effect Transistors (FET) STD5NK52ZD attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

170 mJ

Minimum DS Breakdown Voltage:

520 V

Maximum Drain Current (Abs) (ID):

4.4 A

Maximum Drain Current (ID):

4.4 A

Maximum Drain-Source On Resistance:

1.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

17.6 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD5NK52ZD Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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