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STD4NK50ZD-1

STMicroelectronics

STD4NK50ZD-1 by STMicroelectronics

STD4NK50ZD-1 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 500V breakdown voltage, 12A max pulsed drain current, and operates at up to 150 °C. Ideal for power management in various electronic circuits.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 8,552 parts In-Stock

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Digiode

USA . 3,481 parts In-Stock

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Anansix

USA . 1,186 parts In-Stock

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1,186

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IDEA Electronic Components Group

UK . 2,022 parts In-Stock

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$0.334

100+ parts

-

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$0.301

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2,022

$0.334

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$0.301

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MKK Technologies

India . 1,256 parts In-Stock

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$0.628

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$0.628

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DigiPath Technology Company

USA . 1,256 parts In-Stock

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$0.628

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1,256

$0.628

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AZTECH Wire

Italy . 639 parts In-Stock

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$11.570

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639

$11.570

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Component Stockers USA

USA . 201 parts In-Stock

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$99.990

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QUARKTWIN TECHNOLOGY LTD

USA . 8,550 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,260 parts In-Stock

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4,260

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Authorized Procurement Solutions

USA . 2,500 parts In-Stock

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Corphita

USA . 724 parts In-Stock

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Parana Technologies

USA . 459 parts In-Stock

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$0.399

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459

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$0.399

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Overview

Elevate your projects with the STD4NK50ZD-1 from STMicroelectronics, a leading name in power solutions. This N-channel FET excels in efficiency and reliability, making it ideal for high-performance switching applications. With its robust design, featuring a built-in diode and impressive breakdown voltage, you can trust it for demanding environments. Experience enhanced thermal management and lower energy costs, ensuring your designs are not only powerful but also sustainable. Choose quality, choose STMicroelectronics!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material offers good mechanical strength and thermal stability, making it suitable for various environments.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically offer better performance and lower on-resistance, making them ideal for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides added protection and simplifies the design, enhancing reliability in switching applications.

Transistor Application: SWITCHING

Designed for efficient switching, this transistor is ideal for applications that require rapid transitions and low power loss.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage ensures reliable operation in high-voltage applications, enhancing overall system performance.

Package Shape: RECTANGULAR

The rectangular package design allows for efficient use of PCB space while providing ease of integration into various systems.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide excellent mechanical stability and reliable electrical connections, particularly in high-vibration environments.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for minimal leakage current when off, improving efficiency for power management applications.

Maximum Pulsed Drain Current (IDM): 12 A

The ability to handle high pulsed currents is essential for applications involving transients, increasing versatility in circuits.

Avalanche Energy Rating (EAS): 120 mJ

A high avalanche energy rating indicates resilience against voltage spikes, enhancing robustness in demanding environments.

Maximum Drain Current (Abs) (ID): 3 A

The maximum drain current specification supports moderate current applications, making it suitable for various power electronics.

No. of Terminals: 3

A three-terminal design optimizes connections and simplifies integration into circuits, beneficial for compact designs.

Maximum Power Dissipation (Abs): 45 W

High power dissipation capability ensures reliable performance under load, preventing overheating and extending product lifespan.

Package Style (Meter): IN-LINE

The in-line package style allows for easy handling and placement on PCBs, improving manufacturability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers low on-resistance and fast switching speeds, ideal for power efficiency in modern electronic systems.

Maximum Operating Temperature: 150 °C

The ability to operate at high temperatures ensures reliability and performance in demanding conditions, suitable for industrial applications.

Transistor Element Material: SILICON

Silicon provides excellent thermal and electrical properties, offering a balance of performance and cost, widely used in power devices.

Terminal Finish: MATTE TIN

Matte tin finish enhances solderability, ensuring reliable electrical connections during assembly and reducing production defects.

Maximum Drain Current (ID): 3 A

Repeated specification highlights its suitability for moderate current applications, ensuring adaptability in various designs.

Maximum Drain-Source On Resistance: 2.7 ohm

Low on-resistance minimizes power loss during operation, leading to greater efficiency and cooler operation in circuits.

Terminal Position: SINGLE

Single terminal positioning simplifies layout and circuit design, contributing to more straightforward implementations.

Maximum Time At Peak Reflow Temperature (s): 30

The capability to withstand prolonged peak reflow times enhances compatibility with standard soldering processes in production.

Peak Reflow Temperature °C: 260

High peak reflow temperature tolerance allows this FET to endure harsh soldering conditions without compromising performance.

Technical Specifications

Power Field Effect Transistors (FET) STD4NK50ZD-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

120 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

3 A

Maximum Drain Current (ID):

3 A

Maximum Drain-Source On Resistance:

2.7 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

12 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD4NK50ZD-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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