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STB9NK60ZDT4

STMicroelectronics

STB9NK60ZDT4 by STMicroelectronics

STB9NK60ZDT4 by STMicroelectronics is a robust N-channel FET designed for efficient switching applications. It features a 600V breakdown voltage, 28A pulsed drain current, and operates at up to 150 °C. Ideal for power management in compact electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,593 parts In-Stock

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4,593

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Digiode

USA . 3,809 parts In-Stock

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3,809

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Anansix

USA . 2,127 parts In-Stock

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2,127

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 182 parts In-Stock

1+ parts

$0.715

100+ parts

-

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$0.643

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182

$0.715

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$0.643

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MKK Technologies

India . 1,843 parts In-Stock

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$1.344

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1,843

$1.344

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DigiPath Technology Company

USA . 1,843 parts In-Stock

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$1.344

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1,843

$1.344

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AZTECH Wire

Italy . 91 parts In-Stock

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$12.820

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91

$12.820

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Perfect Parts

USA . 21,706 parts In-Stock

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21,706

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A-Z Elektronik GmbH

Germany . 5,555 parts In-Stock

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5,555

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Alle Elektronik GmbH

Germany . 4,590 parts In-Stock

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4,590

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Corphita

USA . 4,331 parts In-Stock

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4,331

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Parana Technologies

USA . 987 parts In-Stock

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$0.855

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987

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$0.855

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Overview

Unlock the power of efficiency with the STB9NK60ZDT4 from STMicroelectronics! This premium N-channel Power FET is designed for seamless switching applications, offering robust performance and reliability. With a high breakdown voltage and exceptional thermal management, it ensures your devices run cooler and longer. Trust in STMicroelectronics' legacy of innovation to enhance your projects, driving cost savings and superior results. Boost your designs today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package provides robust protection and effective thermal management, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are often preferred for their higher electron mobility, which facilitates better performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode offers additional protection and simplifies the circuit design, providing enhanced reliability in switching applications.

Transistor Application: SWITCHING

As a switching transistor, this FET is designed for high efficiency, delivering fast switching speeds essential for modern electronic applications.

Surface Mount: YES

Surface mount technology allows for compact design and automated assembly processes, reducing overall production costs.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage ensures that this FET can be used in high-voltage applications without the risk of breakdown, enhancing durability.

Package Shape: RECTANGULAR

The rectangular package shape facilitates easy PCB layout and optimizes space utilization in electronic designs.

Terminal Form: GULL WING

Gull wing terminals offer excellent soldering capabilities and mechanical stability, ensuring a reliable connection on the circuit board.

Operating Mode: ENHANCEMENT MODE

Enhancement mode provides better control and efficiency, making this FET suitable for low-power applications while maintaining high performance.

Maximum Pulsed Drain Current (IDM): 28 A

The ability to handle high pulsed drain current makes this FET ideal for applications with transient loads or inrush currents.

Avalanche Energy Rating (EAS): 235 mJ

A high avalanche energy rating signifies robustness against sudden spike conditions, enhancing reliability in harsh environments.

Maximum Drain Current (Abs) (ID): 7 A

The maximum drain current specification allows for safe operation in moderate current applications without thermal issues.

No. of Terminals: 2

With a simple 2-terminal design, this FET is easy to integrate into circuit designs, reducing complexity.

Maximum Power Dissipation (Abs): 104 W

A high power dissipation capability allows the FET to operate effectively under load without overheating, ensuring continuous operation.

Package Style (Meter): SMALL OUTLINE

The small outline package style minimizes space requirements on PCBs, ideal for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides higher input impedance and lower power consumption, making this FET ideal for battery-operated devices.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature ensures that the FET can function in demanding conditions without failure.

Transistor Element Material: SILICON

Silicon is widely used in transistors for its excellent electrical properties and availability, ensuring reliability and performance.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish enhances solderability and prevents oxidation, ensuring a dependable electrical connection.

Maximum Drain Current (ID): 7 A

This reinforces the reliability of the FET in various applications, ensuring it can handle current demands safely.

Maximum Drain-Source On Resistance: 0.95 ohm

A low on-resistance value reduces power loss during operation, improving overall efficiency in switching applications.

Terminal Position: SINGLE

Single terminal positioning simplifies circuit design, making assembly and integration straightforward.

Maximum Time At Peak Reflow Temperature (s): 30

The specified time at peak reflow temperature ensures compatibility with modern soldering processes, supporting efficient assembly.

Peak Reflow Temperature °C: 245

A high peak reflow temperature allows for effective soldering of the device, ensuring a solid mechanical and electrical connection.

Technical Specifications

Power Field Effect Transistors (FET) STB9NK60ZDT4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

235 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

7 A

Maximum Drain Current (ID):

7 A

Maximum Drain-Source On Resistance:

.95 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

28 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB9NK60ZDT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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