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STB50N25M5

STMicroelectronics

STB50N25M5 by STMicroelectronics

STB50N25M5 from STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 28 A, a breakdown voltage of 250 V, and operates at up to 150 °C. Ideal for efficient power management in compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 2,515 parts In-Stock

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Anansix

USA . 2,042 parts In-Stock

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Digiode

USA . 1,070 parts In-Stock

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1,070

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Zilex Electronics Inc.

Canada . 5 parts In-Stock

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IDEA Electronic Components Group

UK . 1,571 parts In-Stock

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$1.105

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$0.994

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1,571

$1.105

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$0.994

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MKK Technologies

India . 2,263 parts In-Stock

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$2.078

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$2.078

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DigiPath Technology Company

USA . 2,263 parts In-Stock

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$2.078

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$2.078

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AZTECH Wire

Italy . 974 parts In-Stock

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$20.980

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974

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Component Stockers USA

USA . 348 parts In-Stock

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$99.990

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Alle Elektronik GmbH

Germany . 3,274 parts In-Stock

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Corphita

USA . 2,504 parts In-Stock

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Parana Technologies

USA . 1,612 parts In-Stock

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$1.321

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$1.321

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A-Z Elektronik GmbH

Germany . 1,532 parts In-Stock

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Perfect Parts

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Overview

Elevate your power management solutions with the STB50N25M5 from STMicroelectronics, a trusted leader in semiconductor innovation. Designed for efficiency and reliability, this N-channel FET excels in switching applications, making it ideal for a variety of electronic devices, from automotive systems to industrial equipment. With its robust construction and advanced technology, you’ll benefit from superior performance and thermal stability, ensuring your projects operate smoothly and effectively. Choose STMicroelectronics for quality that empowers your designs!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material provides durability and resistance to environmental factors, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their efficiency and higher electron mobility, resulting in improved performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode configuration simplifies circuit design and provides added protection against voltage spikes.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast response times and high efficiency.

Surface Mount: YES

Surface mount capability allows for easier integration into modern compact electronic designs, saving PCB space.

Minimum DS Breakdown Voltage: 250 V

A high breakdown voltage enhances reliability under strong electrical conditions, making it suitable for high-voltage applications.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space on PCB layouts, facilitating easier and denser circuit designs.

Terminal Form: GULL WING

Gull wing terminals provide excellent solderability and mechanical stability, ensuring reliable connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption, improving overall efficiency in circuits.

Maximum Pulsed Drain Current (IDM): 112 A

High pulsed drain current capability ensures that the FET can handle brief surges, improving robustness for demanding applications.

Avalanche Energy Rating (EAS): 350 mJ

A high avalanche energy rating indicates strong protection against voltage transients, enhancing reliability.

Maximum Drain Current (Abs) (ID): 28 A

This maximum drain current rating allows for effective power management in various applications.

No. of Terminals: 2

Having only two terminals simplifies the circuit design and component handling.

Maximum Power Dissipation (Abs): 110 W

A high maximum power dissipation rating means better thermal performance and the ability to operate in demanding environments.

Package Style (Meter): SMALL OUTLINE

The small outline package minimizes the footprint, making it ideal for space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low output capacitance, resulting in superior switching speeds.

Maximum Operating Temperature: 150 °C

A high operating temperature rating allows the FET to function efficiently in high-temperature environments.

Transistor Element Material: SILICON

Silicon provides reliable electrical characteristics and is widely used in FET technology, ensuring compatibility and availability.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish helps improve solderability and resist corrosion, leading to long-term reliability.

Maximum Drain Current (ID): 28 A

Reiterating the maximum drain current allows for effective power regulation and robust performance in applications.

Maximum Drain-Source On Resistance: 0.065 ohm

Low on-resistance means reduced power loss during operation, leading to improved efficiency and thermal management.

Terminal Position: SINGLE

A single terminal position simplifies layout requirements and minimizes potential design complications.

Maximum Time At Peak Reflow Temperature (s): 30

The specified reflow time ensures effective soldering while reducing thermal stress on components.

Peak Reflow Temperature °C: 245

A peak reflow temperature of 245 °C accommodates advanced soldering processes, ensuring robust connections.

Technical Specifications

Power Field Effect Transistors (FET) STB50N25M5 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

350 mJ

Minimum DS Breakdown Voltage:

250 V

Maximum Drain Current (Abs) (ID):

28 A

Maximum Drain Current (ID):

28 A

Maximum Drain-Source On Resistance:

.065 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

112 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB50N25M5 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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