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STB50NH02L

STMicroelectronics

STB50NH02L by STMicroelectronics

STB50NH02L by STMicroelectronics is a robust N-channel MOSFET designed for efficient switching applications. It features a max drain current of 50 A, a breakdown voltage of 24 V, and operates at up to 175 °C. Ideal for power management in compact electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,341 parts In-Stock

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3,341

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Anansix

USA . 2,149 parts In-Stock

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2,149

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Digiode

USA . 426 parts In-Stock

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426

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 488 parts In-Stock

1+ parts

$1.102

100+ parts

-

1k+ parts

$0.992

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488

$1.102

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$0.992

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MKK Technologies

India . 1,450 parts In-Stock

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$2.073

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1,450

$2.073

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DigiPath Technology Company

USA . 1,450 parts In-Stock

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$2.073

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1,450

$2.073

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Corphita

USA . 4,088 parts In-Stock

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4,088

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Parana Technologies

USA . 359 parts In-Stock

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$1.318

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359

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$1.318

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Overview

Elevate your designs with the STB50NH02L from STMicroelectronics, a trusted leader in semiconductor innovation. This power FET offers exceptional switching performance and reliability for demanding applications like power management and motor control. With its robust construction and advanced technology, it ensures optimal efficiency and minimal losses, making it an ideal choice for engineers seeking high-quality components that drive success in their projects. Experience the difference with STMicroelectronics!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material ensures durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer better performance and efficiency in switching applications, providing faster operation and lower on-resistance.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances versatility, allowing for applications that require both switching and rectification in a single component.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET enables efficient control of power and signal levels in electronics.

Surface Mount: YES

Surface-mount technology allows for compact designs and automated manufacturing processes, saving space and reducing assembly time.

Minimum DS Breakdown Voltage: 24 V

A minimum breakdown voltage of 24 V provides a robust margin for various applications, ensuring reliability under higher voltage conditions.

Package Shape: RECTANGULAR

The rectangular package shape is optimized for effective mounting on PCBs, facilitating high-density electronic designs.

Terminal Form: GULL WING

Gull wing terminals allow for easy soldering and excellent mechanical connectivity, enhancing the reliability of the component in circuit assemblies.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides high transconductance and low channel resistance, making this FET excellent for amplification and fast-switching applications.

Maximum Pulsed Drain Current (IDM): 200 A

With a high pulsed drain current rating, this FET can handle significant power surges, making it suitable for high-demand applications.

Avalanche Energy Rating (EAS): 200 mJ

The capability to withstand 200 mJ of avalanche energy makes this FET resilient against transient voltage spikes, improving circuit reliability.

Maximum Drain Current (Abs) (ID): 50 A

A maximum continuous drain current of 50 A allows this product to be utilized in high-power applications, increasing its versatility.

No. of Terminals: 2

The simplicity of a two-terminal configuration promotes ease of integration into circuit designs, making it user-friendly.

Maximum Power Dissipation (Abs): 60 W

With a maximum power dissipation of 60 W, this FET can effectively manage heat in demanding applications, ensuring operational reliability.

Package Style (Meter): SMALL OUTLINE

The small outline package style supports compact designs, ideal for applications where space is a premium.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this FET suitable for energy-efficient circuit designs.

Maximum Operating Temperature: 175 °C

Operating at up to 175 °C allows this FET to function reliably in high-temperature environments, expanding its application range.

Transistor Element Material: SILICON

The use of silicon as the material choice offers excellent thermal conductivity and reliability, making it the standard in FET applications.

Terminal Finish: TIN LEAD

Tin lead terminal finishing provides superior solderability and is compatible with most soldering processes, enhancing assembly reliability.

Maximum Drain Current (ID): 50 A

Reiterating the maximum drain current check reinforces the assurance of performance under heavy load conditions.

Maximum Drain-Source On Resistance: 0.0135 ohm

Low on-resistance minimizes power losses during operation, improving overall efficiency in power management applications.

Terminal Position: SINGLE

A single terminal arrangement simplifies PCB layout and eases the integration process in circuit designs.

Case Connection: DRAIN

The clear case connection at the drain simplifies connections and ensures efficient current flow in high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) STB50NH02L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

200 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (Abs) (ID):

50 A

Maximum Drain Current (ID):

50 A

Maximum Drain-Source On Resistance:

.0135 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

200 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB50NH02L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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