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STB55NE06L

STMicroelectronics

STB55NE06L by STMicroelectronics

STB55NE06L by STMicroelectronics is a N-CHANNEL FET with 60V DS Breakdown Voltage, ideal for SWITCHING applications. It features 220A IDM, 0.028 ohm RDS(on), and 200mJ EAS rating. The transistor operates in ENHANCEMENT MODE and has a GULL WING terminal form for surface mount assembly.

Median Price

-

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,356 parts In-Stock

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4,356

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Anansix

USA . 1,397 parts In-Stock

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1,397

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Digiode

USA . 833 parts In-Stock

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833

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ComSIT Distribution GmbH

Germany . 40 parts In-Stock

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40

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,507 parts In-Stock

1+ parts

$1.474

100+ parts

-

1k+ parts

$1.326

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1,507

$1.474

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$1.326

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MKK Technologies

India . 342 parts In-Stock

1+ parts

$2.771

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342

$2.771

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DigiPath Technology Company

USA . 342 parts In-Stock

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$2.771

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342

$2.771

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Parana Technologies

USA . 2,267 parts In-Stock

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$1.762

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2,267

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$1.762

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Corphita

USA . 1,319 parts In-Stock

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1,319

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Assy Fe

Spain . 746 parts In-Stock

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746

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Overview

Experience superior performance and reliability with the STB55NE06L Power FET by STMicroelectronics. As a leading manufacturer in the industry, STMicroelectronics offers cutting-edge technology that delivers efficient switching capabilities for a wide range of applications. From automotive to industrial uses, this N-CHANNEL transistor provides enhanced functionality with a built-in diode, ensuring seamless operation. With a high DS Breakdown Voltage of 60V and maximum Drain Current of 55A, the STB55NE06L is designed to meet your power needs while maximizing energy efficiency. Upgrade your systems today with this top-of-the-line FET solution.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides good insulation properties and high reliability, making it suitable for a wide range of applications.

Polarity or Channel Type: N-CHANNEL

Offers efficient operation in switching applications and allows for lower conduction losses.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design by incorporating a diode for protection, saving space and cost.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient performance in power management.

Surface Mount: YES

Allows for easy and convenient installation on circuit boards, saving assembly time.

Minimum DS Breakdown Voltage: 60 V

Provides a safe operating voltage range for various applications, ensuring reliability and longevity.

Package Shape: RECTANGULAR

Facilitates easy mounting on circuit boards and efficient use of board space.

Terminal Form: GULL WING

Offers reliable solder connections and ease of soldering during assembly.

Operating Mode: ENHANCEMENT MODE

Enables easier control of the transistor and better efficiency in switching applications.

Maximum Pulsed Drain Current (IDM): 220 A

Capable of handling high current pulses, making it suitable for power applications requiring high peak currents.

Avalanche Energy Rating (EAS): 200 mJ

Provides protection against transient voltage spikes, ensuring the reliability of the device in harsh operating conditions.

No. of Terminals: 2

Simple 2-terminal design for easy integration into circuits.

Package Style (Meter): SMALL OUTLINE

Compact package style that saves space on the circuit board while offering high performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizes advanced MOSFET technology for high efficiency and performance in power management.

Transistor Element Material: SILICON

Provides high reliability and performance characteristics for efficient operation in various applications.

Maximum Drain Current (ID): 55 A

Can handle high continuous currents, making it suitable for power applications requiring high current handling capabilities.

Maximum Drain-Source On Resistance: 0.028 ohm

Low on-resistance for efficient power handling and reduced conduction losses.

Terminal Position: SINGLE

Simplified terminal configuration for easy circuit integration.

Case Connection: DRAIN

Allows for efficient heat dissipation and thermal management of the device during operation.

Technical Specifications

Power Field Effect Transistors (FET) STB55NE06L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

200 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (ID):

55 A

Maximum Drain-Source On Resistance:

.028 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

220 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB55NE06L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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