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STB55NF03L

STMicroelectronics

STB55NF03L by STMicroelectronics

STB55NF03L by STMicroelectronics is a high-performance N-channel MOSFET ideal for switching applications. It features a max drain current of 55 A, a breakdown voltage of 30 V, and operates at up to 175 °C. Its compact surface mount design ensures efficient thermal management.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,166 parts In-Stock

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4,166

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Anansix

USA . 1,150 parts In-Stock

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1,150

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Vyrian

USA . 961 parts In-Stock

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961

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 2,143 parts In-Stock

1+ parts

$1.623

100+ parts

-

1k+ parts

$1.461

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2,143

$1.623

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$1.461

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MKK Technologies

India . 1,844 parts In-Stock

1+ parts

$3.052

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1,844

$3.052

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DigiPath Technology Company

USA . 1,844 parts In-Stock

1+ parts

$3.052

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1,844

$3.052

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Kepictronics

USA . 4,500 parts In-Stock

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4,500

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Corphita

USA . 3,509 parts In-Stock

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3,509

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Parana Technologies

USA . 1,374 parts In-Stock

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$1.940

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1,374

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$1.940

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Overview

Elevate your designs with the STB55NF03L from STMicroelectronics, a trusted leader in the semiconductor industry. This N-channel power FET combines exceptional switching performance with robust energy efficiency, making it ideal for a variety of applications—from automotive to industrial control systems. With its compact surface mount design and built-in diode, you'll enjoy simplified layouts and enhanced reliability, ensuring your projects not only meet but exceed expectations. Choose STMicroelectronics for unparalleled quality and innovation!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material ensures durability and protection from environmental factors, making this FET reliable in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their high efficiency and are ideal for switching applications, providing better performance compared to P-channel FETs.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design, providing enhanced protection against reverse voltage scenarios.

Transistor Application: SWITCHING

Designed for switching applications, this FET can efficiently handle high-speed operations, making it suitable for power electronics.

Surface Mount: YES

Surface mount capability allows for compact PCB designs, enabling higher density circuit layouts and reducing overall size.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30V provides reliable operation in high-voltage applications, ensuring device protection.

Package Shape: RECTANGULAR

The rectangular package shape optimizes board space utilization and allows for easier integration into various electronic layouts.

Terminal Form: GULL WING

Gull wing terminals ensure strong mechanical attachment and compatibility with automated assembly processes.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for higher efficiency and power handling capabilities, improving overall performance in applications.

Maximum Pulsed Drain Current (IDM): 220 A

A high pulsed drain current rating of 220 A makes this FET suitable for applications needing short bursts of high current.

Maximum Drain Current (Abs) (ID): 55 A

With an absolute maximum drain current of 55 A, this FET provides robust performance in high-current applications.

No. of Terminals: 2

The simplicity of having two terminals reduces circuit complexity, making design and troubleshooting easier.

Maximum Power Dissipation (Abs): 80 W

An 80 W power dissipation capability ensures that the FET can handle significant power loads without overheating.

Package Style (Meter): SMALL OUTLINE

The small outline package style contributes to space-saving designs and allows for mass production techniques.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance and fast switching speed, making this FET ideal for applications requiring efficiency.

Maximum Operating Temperature: 175 °C

A maximum operating temperature of 175 °C enhances thermal stability and reliability in high-temperature environments.

Transistor Element Material: SILICON

Silicon as the material ensures good electrical properties and durability, making it a standard choice for high-performance transistors.

Terminal Finish: MATTE TIN

Matte tin terminal finish provides excellent solderability and corrosion resistance for a reliable electrical connection.

Maximum Drain Current (ID): 55 A

This reinforced specification supports high-performance applications where consistent current handling is crucial.

Maximum Drain-Source On Resistance: 0.02 ohm

Low on-resistance minimizes power loss and improves efficiency, making this FET ideal for energy-sensitive applications.

Terminal Position: SINGLE

Single terminal position simplifies PCB layout, promoting easier integration within diverse electronic systems.

Case Connection: DRAIN

A drain case connection ensures efficient heat dissipation, enhancing the FET's performance and longevity.

Technical Specifications

Power Field Effect Transistors (FET) STB55NF03L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

55 A

Maximum Drain Current (ID):

55 A

Maximum Drain-Source On Resistance:

.02 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

220 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB55NF03L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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