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STB130NS04ZBT4

STMicroelectronics

STB130NS04ZBT4 by STMicroelectronics

STB130NS04ZBT4 by STMicroelectronics is a high-performance N-channel FET designed for efficient switching applications. It features a max drain current of 80 A, breakdown voltage of 33 V, and operates at up to 175 °C. Ideal for power management in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 8,053 parts In-Stock

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8,053

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Digiode

USA . 2,706 parts In-Stock

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2,706

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Anansix

USA . 1,973 parts In-Stock

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1,973

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 409 parts In-Stock

1+ parts

$0.867

100+ parts

-

1k+ parts

$0.780

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409

$0.867

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$0.780

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MKK Technologies

India . 91 parts In-Stock

1+ parts

$1.630

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91

$1.630

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DigiPath Technology Company

USA . 91 parts In-Stock

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$1.630

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91

$1.630

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AZTECH Wire

Italy . 1,166 parts In-Stock

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$10.920

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1,166

$10.920

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Alle Elektronik GmbH

Germany . 3,927 parts In-Stock

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3,927

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Parana Technologies

USA . 442 parts In-Stock

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$1.036

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442

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$1.036

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Corphita

USA . 216 parts In-Stock

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216

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Overview

Unlock the power of efficiency with the STB130NS04ZBT4 from STMicroelectronics—your ideal solution for seamless switching applications. Renowned for their exceptional quality and innovation, STMicroelectronics delivers a robust N-channel FET that excels in performance, reliability, and thermal management. Perfect for diverse applications, this state-of-the-art component ensures lower energy losses and maximizes your system’s potential, providing unparalleled value to engineers and designers alike.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides excellent durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for higher efficiency and performance, offering better switching speeds, making this product ideal for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode ensures protection against reverse polarity, enhancing the reliability of circuits in which this FET is used.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can effectively handle rapid on/off states, making it suitable for power management systems.

Surface Mount: YES

Surface mount technology allows for compact design, enabling higher density circuit layouts and reducing assembly costs.

Minimum DS Breakdown Voltage: 33 V

The high breakdown voltage provides a greater margin against voltage spikes, ensuring reliable operation in high-voltage applications.

Package Shape: RECTANGULAR

The rectangular shape facilitates easier placement on PCBs, optimizing space and improving thermal management.

Terminal Form: GULL WING

Gull wing terminals offer good soldering characteristics and mechanical strength, ensuring a stable connection to the PCB.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for higher efficiency and lower power consumption, making it suitable for energy-sensitive applications.

Maximum Pulsed Drain Current (IDM): 320 A

A high pulsed current rating enables this FET to handle brief surges, making it ideal for power applications that demand high performance.

Avalanche Energy Rating (EAS): 500 mJ

With a robust avalanche energy rating, this FET can withstand momentary overloads, providing enhanced reliability in fluctuating conditions.

Maximum Drain Current (Abs) (ID): 80 A

The high absolute drain current rating ensures that this FET can handle substantial loads, suitable for various high-current applications.

No. of Terminals: 2

The simplicity of a two-terminal design reduces complexity and enhances reliability in circuit design.

Maximum Power Dissipation (Abs): 300 W

A high power dissipation capability allows this FET to operate effectively under heavy loads without overheating, ensuring durability.

Package Style (Meter): SMALL OUTLINE

The small outline package provides a compact footprint for efficient layout design, ideal for space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance and fast switching times, making this FET suitable for high-speed applications.

Maximum Operating Temperature: 175 °C

With a high operating temperature rating, this FET is ideal for applications in extreme environments, ensuring stable performance.

Transistor Element Material: SILICON

Silicon is a well-established semiconductor material, providing reliability and consistent performance in various applications.

Terminal Finish: MATTE TIN

The matte tin terminal finish enhances solderability and ensures good electrical contact, improving reliability.

Maximum Drain Current (ID): 80 A

A consistent maximum drain current rating allows for predictable performance in applications requiring steady current flow.

Maximum Drain-Source On Resistance: 0.009 ohm

The low on-resistance minimizes power loss and heat generation, making it highly efficient for power applications.

Terminal Position: SINGLE

A single terminal position streamlines PCB design and simplifies circuit connectivity, enhancing ease of use.

Case Connection: DRAIN

Having the drain as the case connection simplifies thermal management and improves heat dissipation.

Technical Specifications

Power Field Effect Transistors (FET) STB130NS04ZBT4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

500 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

33 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.009 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

320 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB130NS04ZBT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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