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NTB10N40

Onsemi

NTB10N40 by Onsemi

The Onsemi NTB10N40 is a N-CHANNEL FET with 400V DS Breakdown Voltage and 35A IDM. Ideal for SWITCHING applications, it features a built-in diode, 0.5 ohm RDS(on), and 142W Pdiss. Suitable for surface mount designs in power electronics systems requiring high current handling capabilities.

Median Price

$1.520

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 85 parts In-Stock

1+ parts

-

100+ parts

$1.520

1k+ parts

$1.260

10k+ parts

$1.120

85

-

$1.520

$1.260

$1.120

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 2,488 parts In-Stock

1+ parts

$1.188

100+ parts

-

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2,488

$1.188

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Vyrian

USA . 5,850 parts In-Stock

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5,850

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Distributors (Availability)

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Corphita

USA . 982 parts In-Stock

1+ parts

$1.125

100+ parts

-

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-

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982

$1.125

-

-

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Corohmni

South Africa . 217 parts In-Stock

1+ parts

$1.250

100+ parts

-

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217

$1.250

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-

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Microchip USA

USA . 122 parts In-Stock

1+ parts

$7.800

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122

$7.800

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Problanco Electronics

Mexico . 6,978 parts In-Stock

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6,978

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Kulean Microsystems

USA . 5,674 parts In-Stock

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5,674

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TANS Electronics

Latvia . 4,168 parts In-Stock

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4,168

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SupplyDigital Components

Austria . 671 parts In-Stock

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671

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UHIMA Technologies

Türkiye . 14 parts In-Stock

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14

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Overview

Unleash the power of the NTB10N40 from Onsemi, a top-of-the-line Power Field Effect Transistor that sets the standard for quality and reliability. This N-CHANNEL transistor with a built-in diode is perfect for switching applications, offering a high DS Breakdown Voltage of 400V and a maximum Drain Current of 10A. With its small outline package and gull wing terminals, this transistor is ideal for a wide range of electronic devices. Trust Onsemi's expertise in semiconductor technology and enhance your products' performance with the NTB10N40. Elevate your designs with the superior value and benefits this transistor brings to the table.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection to the internal components of the transistor, making it suitable for various environments.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically have lower on-resistance and higher performance compared to P-Channel FETs, making them ideal for many applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and can protect against reverse voltages, enhancing the reliability of the transistor.

Transistor Application: SWITCHING

Designed for switching applications, this FET can handle high current and voltage, making it suitable for power control and regulation.

Surface Mount: YES

Surface-mount technology allows for efficient and compact PCB design, saving space and enabling easier assembly.

Minimum DS Breakdown Voltage: 400 V

With a high breakdown voltage, this FET can withstand high voltage spikes and surges, enhancing the reliability of the system.

Maximum Power Dissipation (Abs): 142 W

The high power dissipation capability allows the transistor to handle high power loads without overheating, ensuring long-term reliability.

Technical Specifications

Power Field Effect Transistors (FET) NTB10N40 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

500 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

400 V

Maximum Drain Current (Abs) (ID):

10 A

Maximum Drain Current (ID):

10 A

Maximum Drain-Source On Resistance:

.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

35 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Powers

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB10N40 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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