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MTB3N120E

Onsemi

MTB3N120E by Onsemi

The Onsemi MTB3N120E is a N-CHANNEL Power FET with 1200V DS Breakdown Voltage, 11A IDM, and 101mJ EAS. Ideal for SWITCHING applications, it features a SINGLE configuration with BUILT-IN DIODE in a PLASTIC/EPOXY package. Operating in ENHANCEMENT MODE, it has a max power dissipation of 125W at 150 °C.

Median Price

$0.700

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

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Vyrian

USA . 293 parts In-Stock

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$0.700

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Digiode

USA . 1,777 parts In-Stock

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Sunrise Surplus Inc.

USA . 12 parts In-Stock

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LittleDiode

UK . 1 parts In-Stock

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SupplyDigital Components

Austria . 8,145 parts In-Stock

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TANS Electronics

Latvia . 5,588 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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Corphita

USA . 1,806 parts In-Stock

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UHIMA Technologies

Türkiye . 364 parts In-Stock

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Kulean Microsystems

USA . 333 parts In-Stock

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Problanco Electronics

Mexico . 247 parts In-Stock

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Corohmni

South Africa . 77 parts In-Stock

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Overview

Enhance your power switching applications with the MTB3N120E by Onsemi. Crafted with precision and quality materials, this N-CHANNEL Power FET offers reliable performance and enhanced functionality. With a built-in diode for added convenience, this transistor is perfect for a wide range of switching tasks. Experience the benefits of its 1200 V breakdown voltage, 125 W power dissipation, and 5 ohm on-resistance. Trust Onsemi's expertise in semiconductor technology to bring you a high-performance solution that delivers value and efficiency to your projects. Choose the MTB3N120E for superior performance and peace of mind.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package material provides durability and protection for the internal components of the FET, ensuring long-term reliability.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower ON-resistance compared to P-channel FETs, resulting in lower power dissipation and higher efficiency.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for faster switching speeds and provides protection against reverse voltage and current spikes.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers high efficiency and fast response times in controlling current flow.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are normally-off devices, providing more precise control over the switching operation and reducing power consumption when in the off state.

Maximum Power Dissipation (Abs): 125 W

With a high power dissipation rating, this FET can handle significant power levels without overheating, making it suitable for high-power applications.

Maximum Operating Temperature: 150 °C

The FET can operate at high temperatures without performance degradation, ensuring reliability in demanding environmental conditions.

Technical Specifications

Power Field Effect Transistors (FET) MTB3N120E attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

101 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

1200 V

Maximum Drain Current (Abs) (ID):

3 A

Maximum Drain Current (ID):

3 A

Maximum Drain-Source On Resistance:

5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

11 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTB3N120E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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