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MTB20N20ET4

Onsemi

MTB20N20ET4 by Onsemi

MTB20N20ET4 by Onsemi is a N-CHANNEL Power FET with 200V DS Breakdown Voltage, ideal for SWITCHING applications. It features 60A Max Pulsed Drain Current, 600mJ Avalanche Energy Rating, and 0.16 ohm Max DS On Resistance. The transistor operates in ENHANCEMENT MODE with a max power dissipation of 125W at 150 °C.

Median Price

$2.780

Lifecycle Status

Suppliers In-Stock

8

In-Stock Inventory

1k+

Distributors (In-Stock)

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American Microsemiconductor Inc.

USA . 400 parts In-Stock

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Inventory MP

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Bristol Electronics

USA . 4,964 parts In-Stock

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Vyrian

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Digiode

USA . 1,522 parts In-Stock

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Dan-Mar Components

USA . 409 parts In-Stock

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ComSIT Distribution GmbH

Germany . 217 parts In-Stock

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Electronics Depot

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Corohmni

South Africa . 173 parts In-Stock

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Problanco Electronics

Mexico . 6,297 parts In-Stock

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Kulean Microsystems

USA . 5,049 parts In-Stock

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Authorized Procurement Solutions

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TANS Electronics

Latvia . 2,265 parts In-Stock

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Perfect Parts

USA . 1,790 parts In-Stock

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SupplyDigital Components

Austria . 833 parts In-Stock

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Cyclops Electronics Ltd (Excess)

UK . 799 parts In-Stock

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UHIMA Technologies

Türkiye . 532 parts In-Stock

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Corphita

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Overview

Unleash the power of innovation with the MTB20N20ET4 by Onsemi. This high-quality Power FET offers unmatched performance in switching applications, providing customers with reliable and efficient solutions. Manufactured by Onsemi, a trusted leader in semiconductor technology, this N-CHANNEL transistor is designed for enhanced mode operation, delivering a maximum drain current of 20 A and a minimum DS breakdown voltage of 200 V. With a compact rectangular package style and a built-in diode, this FET is perfect for a wide range of applications. Experience the value and benefits of the MTB20N20ET4 and take your projects to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material provides durability and protection for the FET, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally have higher electron mobility and faster switching speeds compared to P-channel FETs, making them a good choice for switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers high efficiency and fast switching speeds.

Maximum Drain Current (ID): 20 A

With a maximum drain current of 20 A, this FET can handle high-current applications with ease.

Maximum Power Dissipation (Abs): 125 W

The high power dissipation capability of 125 W ensures that the FET can handle high power loads without overheating.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand elevated temperatures without compromising performance.

Technical Specifications

Power Field Effect Transistors (FET) MTB20N20ET4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

600 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

200 V

Maximum Drain Current (Abs) (ID):

20 A

Maximum Drain Current (ID):

20 A

Maximum Drain-Source On Resistance:

.16 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

60 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTB20N20ET4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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