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MMDF2P01HDR1

Onsemi

MMDF2P01HDR1 by Onsemi

MMDF2P01HDR1 by Onsemi is a P-CHANNEL FET with 2 elements, ideal for SWITCHING applications. It features a 12V DS Breakdown Voltage, 0.2 ohm Drain-Source On Resistance, and can handle up to 2A Drain Current. This small outline transistor in gull wing package is designed for surface mount use.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 2,121 parts In-Stock

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Digiode

USA . 317 parts In-Stock

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317

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Problanco Electronics

Mexico . 7,401 parts In-Stock

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Kulean Microsystems

USA . 7,338 parts In-Stock

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TANS Electronics

Latvia . 4,692 parts In-Stock

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SupplyDigital Components

Austria . 1,444 parts In-Stock

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Corphita

USA . 1,050 parts In-Stock

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Metaverse IC Inc.

Canada . 600 parts In-Stock

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Corohmni

South Africa . 491 parts In-Stock

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UHIMA Technologies

Türkiye . 457 parts In-Stock

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Overview

Elevate your electronic devices with the MMDF2P01HDR1 by Onsemi, a top-tier Power Field Effect Transistor designed for optimal performance. Manufactured by industry leader Onsemi, this P-CHANNEL transistor offers unparalleled quality and reliability for all your switching applications. With a minimum DS breakdown voltage of 12V and a maximum drain current of 2A, this transistor ensures efficient power management without compromising on durability. Trust Onsemi to deliver cutting-edge technology that enhances the functionality and longevity of your devices.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material ensures durability and reliability, making the product suitable for various applications.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low on-state resistance and high efficiency, which can improve overall system performance.

Configuration: SEPARATE, 2 ELEMENTS

Having 2 separate elements allows for more flexibility in circuit design and can improve overall efficiency.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast and efficient operation.

Surface Mount: YES

Surface mount technology allows for easy and compact PCB integration, saving space and reducing assembly time.

Minimum DS Breakdown Voltage: 12 V

Having a minimum breakdown voltage of 12V ensures safe and reliable operation in various voltage conditions.

Package Shape: RECTANGULAR

Rectangular shape allows for easy mounting and space-efficient PCB layout.

Terminal Form: GULL WING

Gull wing terminals provide secure mounting and easy soldering, ensuring a reliable connection.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are known for their fast switching speed and high efficiency, making this product suitable for demanding applications.

No. of Elements: 2

Having 2 separate elements allows for more versatility in circuit design and can improve overall performance.

No. of Terminals: 8

Having 8 terminals allows for more connection options and can provide greater flexibility in circuit design.

Package Style (Meter): SMALL OUTLINE

Small outline package style saves space on the PCB and allows for compact designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high reliability and performance, making this product a good choice for various applications.

Transistor Element Material: SILICON

Silicon is a commonly used material for FETs due to its high conductivity and reliability.

Terminal Finish: TIN LEAD

Tin lead finish provides good solderability and ensures a reliable electrical connection.

Maximum Drain Current (ID): 2 A

With a maximum drain current of 2A, this FET can handle higher current loads, making it suitable for various applications.

Maximum Drain-Source On Resistance: 0.2 ohm

Low on-resistance of 0.2 ohms ensures efficient power transfer and minimal power loss.

Terminal Position: DUAL

Dual terminal position offers more flexibility in circuit connections and can improve overall system design.

Technical Specifications

Power Field Effect Transistors (FET) MMDF2P01HDR1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Minimum DS Breakdown Voltage:

12 V

Maximum Drain Current (ID):

2 A

Maximum Drain-Source On Resistance:

.2 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e0

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MMDF2P01HDR1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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