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MMDF3N03HDR2

Onsemi

MMDF3N03HDR2 by Onsemi

MMDF3N03HDR2 by Onsemi is a N-CHANNEL Power FET with 30V DS Breakdown Voltage, ideal for SWITCHING applications. It features a Max IDM of 40A and EAS of 324mJ, suitable for high-power operations. With a 0.07 ohm RDS(on), this MOSFET operates in ENHANCEMENT MODE at up to 150 °C, making it versatile for various electronic designs.

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Overview

Looking for reliable power field effect transistors for your switching applications? Look no further than the MMDF3N03HDR2 by Onsemi. With a maximum pulsing drain current of 40A and a low on-resistance of just 0.07 ohms, this N-channel transistor offers high performance in a compact package. Onsemi's reputation for quality and innovation ensures that you're getting a product you can trust. Whether you're designing industrial equipment, automotive systems, or consumer electronics, the MMDF3N03HDR2 provides the power and efficiency you need to take your project to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and protection for the FET, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower ON-resistance and higher switching speeds, making them efficient for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and helps protect against voltage spikes, enhancing the reliability of the FET.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast switching speeds and efficient performance.

Surface Mount: YES

Being surface mountable makes it easier to integrate into compact PCB designs, saving space and reducing assembly time.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this FET can handle relatively high voltage applications reliably.

Package Shape: RECTANGULAR

The rectangular package shape allows for easy placement on the PCB and efficient use of space within the circuit design.

Terminal Form: GULL WING

The gull wing terminal form provides secure connections during assembly and ensures stable electrical connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are normally off devices, which can simplify circuit design and reduce power consumption when not switching.

Maximum Pulsed Drain Current (IDM): 40 A

With a high pulsed drain current rating of 40A, this FET can handle short-duration high-current pulses without damage.

Avalanche Energy Rating (EAS): 324 mJ

The high avalanche energy rating of 324 mJ indicates the FET's ability to withstand avalanche breakdown conditions, improving robustness.

Maximum Drain Current (Abs) (ID): 4.1 A

The FET can handle continuous drain currents of up to 4.1A, making it suitable for a wide range of applications.

No. of Terminals: 8

Having 8 terminals allows for versatile connections and compatibility with various circuit designs.

Maximum Power Dissipation (Abs): 2 W

With a maximum power dissipation of 2W, the FET can efficiently handle heat dissipation under normal operating conditions.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the PCB while maintaining proper heat dissipation for reliable performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high performance and reliability, making this FET suitable for demanding applications.

Maximum Operating Temperature: 150 °C

The FET can operate at temperatures up to 150 °C, ensuring reliability in high-temperature environments.

Transistor Element Material: SILICON

Silicon-based transistor elements provide excellent electrical properties and long-term reliability for consistent performance.

Terminal Finish: TIN LEAD

The tin lead terminal finish ensures good solderability and reliable electrical connections during assembly.

Maximum Drain-Source On Resistance: 0.07 ohm

With a low on-resistance of 0.07 ohms, the FET minimizes power loss and heat generation during operation, improving efficiency.

Terminal Position: DUAL

Having dual terminal positions offers flexibility in circuit layout and connection options for versatile applications.

Peak Reflow Temperature °C: 235

The high peak reflow temperature of 235 °C ensures reliable soldering during assembly and can withstand high-temperature reflow processes.

Technical Specifications

Power Field Effect Transistors (FET) MMDF3N03HDR2 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED, LOGIC LEVEL COMPATIBLE, ULTRA-LOW RESISTANCE

Avalanche Energy Rating (EAS):

324 mJ

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

4.1 A

Maximum Drain Current (ID):

4.1 A

Maximum Drain-Source On Resistance:

.07 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

2 W

Maximum Pulsed Drain Current (IDM):

40 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Powers

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MMDF3N03HDR2 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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