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MMDF2C03HDR2G

Onsemi

MMDF2C03HDR2G by Onsemi

MMDF2C03HDR2G by Onsemi is a Power FET with N-CHANNEL and P-CHANNEL configuration, ideal for switching applications. It features 30V DS breakdown voltage, 21A max pulsed drain current, and 0.07 ohm max drain-source resistance. With a small outline package style and operating temperature up to 150 °C, it's suitable for various power management tasks.

Median Price

$3.080

Lifecycle Status

Suppliers In-Stock

7

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Component Electronics Inc.

Canada . 31 parts In-Stock

1+ parts

$3.080

100+ parts

$2.310

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$2.000

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31

$3.080

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$2.000

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Chip Stock

USA . 14,300 parts In-Stock

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Vyrian

USA . 5,921 parts In-Stock

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Freddi Giovanni

Italy . 2,100 parts In-Stock

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Martec Srl

Italy . 2,000 parts In-Stock

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2,000

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Digiode

USA . 1,695 parts In-Stock

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J2 Sourcing AB

Sweden . 1,121 parts In-Stock

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Distributors (Availability)

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Corohmni

South Africa . 477 parts In-Stock

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$3.080

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477

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AZTECH Wire

Italy . 158 parts In-Stock

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$9.400

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158

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Problanco Electronics

Mexico . 6,820 parts In-Stock

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Kulean Microsystems

USA . 4,224 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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Perfect Parts

USA . 2,240 parts In-Stock

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Kepictronics

USA . 1,860 parts In-Stock

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1,860

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TANS Electronics

Latvia . 1,132 parts In-Stock

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Corphita

USA . 963 parts In-Stock

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SupplyDigital Components

Austria . 932 parts In-Stock

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UHIMA Technologies

Türkiye . 194 parts In-Stock

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Overview

Enhance the efficiency of your electronic devices with the MMDF2C03HDR2G by Onsemi, a top-quality Power Field Effect Transistor. Manufactured by industry leader Onsemi, this transistor offers separate N-CHANNEL and P-CHANNEL configurations with built-in diodes, making it perfect for switching applications. With a maximum pulsed drain current of 21 A and a low on-resistance of 0.07 ohm, this transistor delivers high performance and reliability. Upgrade your devices today and experience the benefits of superior power management with the MMDF2C03HDR2G.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material offers good durability and protection for the FET, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL AND P-CHANNEL

Having both N-channel and P-channel types allows for flexibility in circuit design and compatibility with different configurations.

Configuration: SEPARATE, 2 ELEMENTS WITH BUILT-IN DIODE

The built-in diode enhances efficiency and performance of the FET, making it a reliable choice for switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers optimized performance in such scenarios.

Surface Mount: YES

With surface mount capability, this FET is easy to integrate onto circuit boards, saving space and simplifying assembly.

Minimum DS Breakdown Voltage: 30 V

The minimum breakdown voltage of 30V ensures reliable operation and protection against voltage spikes.

Terminal Form: GULL WING

The gull wing terminal form allows for easy and secure soldering onto PCBs, ensuring a reliable connection.

Operating Mode: ENHANCEMENT MODE

The enhancement mode operation offers improved control over the FET's conductance, making it ideal for various applications where precise switching is required.

Maximum Pulsed Drain Current (IDM): 21 A

The high pulsed drain current capability allows for handling sudden peak loads, making this FET suitable for demanding applications.

Avalanche Energy Rating (EAS): 324 mJ

The high avalanche energy rating ensures the FET can withstand sudden voltage spikes without damage, enhancing its reliability and longevity.

Maximum Drain Current (Abs) (ID): 4.1 A

The maximum drain current rating of 4.1A allows for efficient operation within safe operating limits, ensuring reliable performance.

No. of Terminals: 8

With 8 terminals, this FET offers versatile connectivity options for various circuit configurations.

Maximum Power Dissipation (Abs): 2 W

The high maximum power dissipation rating of 2W ensures the FET can handle heat dissipation effectively, enhancing its overall reliability.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the PCB, making this FET suitable for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The metal-oxide semiconductor technology offers high performance and reliability, making this FET a durable choice for various applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand high temperature environments, ensuring reliable operation under harsh conditions.

Transistor Element Material: SILICON

The silicon material of the transistor element offers excellent performance characteristics, making this FET a reliable choice for demanding applications.

Terminal Finish: Tin (Sn)

The tin terminal finish ensures good conductivity and solderability, making it easy to assemble and maintain connections.

Maximum Drain-Source On Resistance: 0.07 ohm

The low drain-source on resistance of 0.07 ohms minimizes power losses and improves efficiency, making this FET suitable for high-performance applications.

Terminal Position: DUAL

The dual terminal position allows for easy installation and connectivity in various circuit layouts, enhancing flexibility in design.

Maximum Time At Peak Reflow Temperature (s): 40

The maximum time at peak reflow temperature of 40 seconds ensures reliable soldering and prevents damage to the FET during assembly.

Peak Reflow Temperature °C: 260

With a peak reflow temperature of 260 °C, this FET can withstand high-temperature soldering processes, ensuring reliable connections during assembly.

Technical Specifications

Power Field Effect Transistors (FET) MMDF2C03HDR2G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

324 mJ

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

4.1 A

Maximum Drain Current (ID):

4.1 A

Maximum Drain-Source On Resistance:

.07 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

2 W

Maximum Pulsed Drain Current (IDM):

21 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MMDF2C03HDR2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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