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MLD1N06CLG

Onsemi

MLD1N06CLG by Onsemi

MLD1N06CLG by Onsemi is a N-CHANNEL Power FET with SINGLE configuration. It operates in ENHANCEMENT MODE, has 40W power dissipation, and can withstand temperatures up to 150 °C. Ideal for applications requiring high-power handling in surface mount technology.

Median Price

-

Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 1,397 parts In-Stock

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Digiode

USA . 1,352 parts In-Stock

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1,352

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Distributors (Availability)

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Kulean Microsystems

USA . 8,015 parts In-Stock

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8,015

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TANS Electronics

Latvia . 5,986 parts In-Stock

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SupplyDigital Components

Austria . 5,936 parts In-Stock

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5,936

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Problanco Electronics

Mexico . 4,972 parts In-Stock

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4,972

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Corphita

USA . 1,239 parts In-Stock

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1,239

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UHIMA Technologies

Türkiye . 774 parts In-Stock

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774

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Corohmni

South Africa . 191 parts In-Stock

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Overview

Unleash the power of innovation with the MLD1N06CLG by Onsemi. As a leading manufacturer in the industry, Onsemi guarantees top-notch quality and reliability in their products. The MLD1N06CLG is a must-have in the Power Field Effect Transistor category, offering customers seamless performance and enhanced efficiency. With its N-CHANNEL polarity and SINGLE configuration, this transistor is designed for maximum power dissipation of 40W, making it ideal for a wide range of applications. Experience the value and benefits that the MLD1N06CLG brings to your projects today!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are known for their high efficiency and fast switching speeds, making them ideal for applications requiring high performance.

Configuration: SINGLE

A single configuration simplifies the design and reduces the chances of circuit errors, making the product easier to integrate into various systems.

Surface Mount: YES

Surface mount technology allows for higher component density on circuit boards, saving space and improving overall system performance.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are easier to control and have lower on-state resistance, resulting in better overall efficiency and performance.

Maximum Power Dissipation (Abs): 40 W

With a high maximum power dissipation, this product can handle high power levels without overheating, ensuring reliable operation in demanding conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers excellent performance characteristics such as high speed, low power consumption, and high reliability, making this product a solid choice for various applications.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this product can withstand elevated temperatures without performance degradation, making it suitable for a wide range of operating conditions.

Technical Specifications

Power Field Effect Transistors (FET) MLD1N06CLG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

MLD1N06CLG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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