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FQB8N60C

Onsemi

FQB8N60C by Onsemi

FQB8N60C by Onsemi is a N-CHANNEL Power FET with 600V DS Breakdown Voltage, ideal for SWITCHING applications. It features a Max IDM of 30A and EAS of 230mJ, operating in ENHANCEMENT MODE at up to 150 °C. This PLASTIC/EPOXY transistor has a SINGLE configuration with BUILT-IN DIODE, GULL WING terminals, and DRAIN case connection.

Median Price

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Digiode

USA . 786 parts In-Stock

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Vyrian

USA . 697 parts In-Stock

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Andel Nordic

Denmark . 500 parts In-Stock

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$10.441

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$10.024

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$10.441

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Metaverse IC Inc.

Canada . 50,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,256 parts In-Stock

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SupplyDigital Components

Austria . 5,196 parts In-Stock

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Problanco Electronics

Mexico . 4,366 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,504 parts In-Stock

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Kulean Microsystems

USA . 3,006 parts In-Stock

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Supply Digital

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Corphita

USA . 2,333 parts In-Stock

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Northwest PG Solutions

USA . 1,484 parts In-Stock

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TANS Electronics

Latvia . 1,431 parts In-Stock

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Assy Fe

Spain . 1,000 parts In-Stock

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Native Components

USA . 564 parts In-Stock

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UHIMA Technologies

Türkiye . 403 parts In-Stock

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Corohmni

South Africa . 216 parts In-Stock

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Overview

Discover the power of the FQB8N60C by Onsemi, a top-quality N-channel Power Field Effect Transistor (FET) designed for switching applications. Manufactured with precision and expertise by Onsemi, this transistor offers unparalleled performance and reliability. With a maximum DS Breakdown Voltage of 600V and a built-in diode, this transistor ensures efficient operation while handling high pulsed drain currents. Ideal for enhancing your electronic projects, the FQB8N60C provides superior functionality in a compact package. Upgrade your designs with the trusted quality and advanced technology of Onsemi's FQB8N60C.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection, making the product suitable for various applications.

Polarity or Channel Type: N-CHANNEL

Enhances switching efficiency and performance.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies the circuit design and saves space by integrating a diode within the transistor.

Transistor Application: SWITCHING

Optimized for fast switching applications.

Surface Mount: YES

Enables easy mounting on PCBs, saving assembly time and effort.

Minimum DS Breakdown Voltage: 600 V

Ensures reliable operation under high voltage conditions.

Package Shape: RECTANGULAR

Facilitates compact and efficient PCB layout.

Terminal Form: GULL WING

Easy to solder and provides mechanical strength to the connections.

Operating Mode: ENHANCEMENT MODE

Offers high efficiency and fast response in switching mode.

Maximum Pulsed Drain Current (IDM): 30 A

Capable of handling high current pulses efficiently.

Avalanche Energy Rating (EAS): 230 mJ

Resistant to voltage spikes and surges, ensuring long-term reliability.

No. of Terminals: 2

Simplifies the connection setup and reduces complexity.

Package Style (Meter): SMALL OUTLINE

Compact form factor saves space on the PCB.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Provides high efficiency and reliability in operation.

Maximum Operating Temperature: 150 °C

Suitable for applications requiring high-temperature operation.

Transistor Element Material: SILICON

Offers high performance and durability for extended use.

Maximum Drain Current (ID): 7.5 A

Capable of handling moderate continuous current efficiently.

Maximum Drain-Source On Resistance: 1.2 ohm

Low on-resistance ensures minimal power loss and heat generation.

Terminal Position: SINGLE

Simplified connection setup and reduced chances of error.

Case Connection: DRAIN

Ensures efficient heat dissipation from the device.

Technical Specifications

Power Field Effect Transistors (FET) FQB8N60C attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

230 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (ID):

7.5 A

Maximum Drain-Source On Resistance:

1.2 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

30 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FQB8N60C Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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