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FDD3N50NZ

Onsemi

FDD3N50NZ by Onsemi

FDD3N50NZ by Onsemi is a N-CHANNEL Power FET with 500V DS Breakdown Voltage and 2.5A ID. Ideal for SWITCHING applications, it features a built-in DIODE, 10A IDM, and 114mJ EAS rating. This ENHANCEMENT MODE transistor comes in a GULL WING package style for surface mount assembly.

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Native Components

USA . 893 parts In-Stock

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Northwest PG Solutions

USA . 988 parts In-Stock

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Problanco Electronics

Mexico . 6,118 parts In-Stock

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TANS Electronics

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Kulean Microsystems

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SupplyDigital Components

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Corphita

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UHIMA Technologies

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Overview

Power up your projects with the FDD3N50NZ by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power Field Effect Transistors (FET) like no other. This N-CHANNEL transistor with a built-in diode is perfect for switching applications, offering a minimum DS breakdown voltage of 500V and a maximum pulsed drain current of 10A. Its small outline package shape and gull wing terminal form make it easy to integrate into any project. Trust Onsemi's expertise and choose the FDD3N50NZ for enhanced performance and reliability in your designs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and protection for the internal components of the transistor, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have lower on-resistance and higher efficiency compared to P-channel transistors, making them a good choice for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps in preventing reverse currents and voltage spikes, providing added protection to the circuit in which the transistor is used.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor offers fast switching speed and low power dissipation for improved performance.

Surface Mount: YES

Being surface mountable, this transistor is easy to install on circuit boards and allows for high-density mounting, saving space and simplifying assembly.

Minimum DS Breakdown Voltage: 500 V

With a high breakdown voltage, this transistor can handle high voltages, making it suitable for use in systems that require robust protection against voltage spikes.

Package Shape: RECTANGULAR

The rectangular shape of the package allows for easy and secure mounting on circuit boards, ensuring stability and reliability in various applications.

Terminal Form: GULL WING

The gull wing terminal form provides secure and reliable connections, making it easier to solder the transistor onto the PCB and reducing the risk of disconnection.

Operating Mode: ENHANCEMENT MODE

Operating in enhancement mode means the transistor is normally off and requires a positive voltage to turn on, offering better control and efficiency in switching applications.

Maximum Pulsed Drain Current (IDM): 10 A

With a high pulsed drain current rating, this transistor can handle short bursts of high current, making it suitable for applications that require high power handling capabilities.

Avalanche Energy Rating (EAS): 114 mJ

The high avalanche energy rating indicates the transistor's ability to withstand high-energy pulses, providing additional protection against voltage spikes and transient events.

No. of Terminals: 2

With only two terminals, this transistor is easy to integrate into circuit designs and offers simplicity in connection, reducing complexity and potential points of failure.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the PCB, allowing for compact and efficient circuit designs while providing high performance and reliability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high efficiency and fast switching speeds, making this transistor suitable for applications requiring low power consumption and quick response times.

Transistor Element Material: SILICON

Silicon is a widely used semiconductor material known for its reliability and efficiency, ensuring the transistor delivers consistent performance and durability in various operating conditions.

Maximum Drain Current (ID): 2.5 A

With a high maximum drain current rating, this transistor can handle continuous currents of up to 2.5 A, making it suitable for medium to high-power applications.

Maximum Drain-Source On Resistance: 2.5 ohm

The low drain-source on resistance helps minimize power loss and heat generation in the transistor, improving efficiency and overall performance in switching applications.

Terminal Position: SINGLE

Having a single terminal position simplifies the installation and connection process, ensuring proper alignment and reducing the risk of errors or malfunctions.

Case Connection: DRAIN

The drain connection is commonly used in power transistors for efficient power handling and control, ensuring reliable performance and safety in high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) FDD3N50NZ attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

114 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (ID):

2.5 A

Maximum Drain-Source On Resistance:

2.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

10 A

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FDD3N50NZ Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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