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FDD3N50NZTM

Onsemi

FDD3N50NZTM by Onsemi

FDD3N50NZTM by Onsemi is a N-CHANNEL Power FET with 500V DS Breakdown Voltage and 2.5A Drain Current. Ideal for SWITCHING applications, it features a built-in DIODE, 10A Pulsed Drain Current, and 40W Power Dissipation in a small outline package.

Median Price

$0.308

Lifecycle Status

Suppliers In-Stock

12

In-Stock Inventory

1k+

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Arrow

USA . 5 parts In-Stock

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$0.308

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Chip1Stop

Japan . 5 parts In-Stock

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Digiode

USA . 1,466 parts In-Stock

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$0.356

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Nova Conductors

Japan . 200 parts In-Stock

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$0.438

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Bristol Electronics

USA . 380 parts In-Stock

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$1.875

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$0.750

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Chip Stock

USA . 43,200 parts In-Stock

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Vyrian

USA . 3,984 parts In-Stock

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ComSIT Distribution GmbH

Germany . 2,500 parts In-Stock

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ComSIT USA

USA . 2,500 parts In-Stock

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Flip Electronics

USA . 1,962 parts In-Stock

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ACDS - Activité Composants Distribution Service

France . 380 parts In-Stock

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Dan-Mar Components

USA . 380 parts In-Stock

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Ampacity Inc.

Singapore . 5 parts In-Stock

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$0.262

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$0.262

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Semicontronic

India . 5 parts In-Stock

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$0.262

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$0.255

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$0.254

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$0.262

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Corphita

USA . 2,086 parts In-Stock

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$0.338

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Corohmni

South Africa . 437 parts In-Stock

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$0.375

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Continental Prestige Electronics

USA . 5,243 parts In-Stock

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$0.438

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$0.429

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Argo Parts USA

USA . 1,300 parts In-Stock

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$0.438

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$0.425

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$0.438

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$0.425

Aztec Data Supply Inc.

USA . 1,000 parts In-Stock

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$0.822

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$0.822

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AZTECH Wire

Italy . 257 parts In-Stock

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$14.349

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RC Electronics

USA . 80,174 parts In-Stock

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Lixinc

USA . 15,987 parts In-Stock

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Perfect Parts

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Problanco Electronics

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Supply Digital

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iodParts Technologies Inc.

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Kulean Microsystems

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UHIMA Technologies

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Microchip USA

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Cyclops Electronics Ltd (Excess)

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Netroflash

USA . 50 parts In-Stock

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Overview

Looking for a reliable and high-quality Power Field Effect Transistor (FET) for your switching applications? Look no further than the FDD3N50NZTM by Onsemi. With a minimum DS Breakdown Voltage of 500V and maximum Pulsed Drain Current of 10A, this N-CHANNEL transistor offers exceptional performance and efficiency. Its single configuration with built-in diode ensures seamless operation, while its small outline package shape allows for easy installation. Trust Onsemi's expertise in semiconductor technology to deliver a product that guarantees superior functionality and value. Upgrade your systems with the FDD3N50NZTM and experience innovation at its finest.

Feature Benefit Bullets

Package Body Material PLASTIC/EPOXY

Plastic/Epoxy material provides durability and reliability for long-term usage.

Polarity or Channel Type N-CHANNEL

N-Channel type offers better efficiency and lower resistance for improved performance.

Transistor Application SWITCHING

Specifically designed for switching applications, ensuring high speed and efficiency.

Maximum DS Breakdown Voltage 500 V

High breakdown voltage makes it suitable for high voltage applications, ensuring safety and reliability.

Operating Mode ENHANCEMENT MODE

Enhancement mode operation provides better control and efficiency during operation.

Maximum Pulsed Drain Current (IDM) 10 A

High current handling capability allows for reliable performance under heavy load conditions.

Avalanche Energy Rating (EAS) 114 mJ

High avalanche energy rating protects the transistor from voltage spikes, ensuring reliability in harsh conditions.

Maximum Power Dissipation (Abs) 40 W

High power dissipation capability allows for continuous operation without overheating.

Maximum Operating Temperature 150 °C

Wide operating temperature range enables usage in various environmental conditions.

Maximum Drain-Source On Resistance 2.5 ohm

Low on-resistance reduces power loss and improves efficiency during operation.

Technical Specifications

Power Field Effect Transistors (FET) FDD3N50NZTM attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

114 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

2.5 A

Maximum Drain Current (ID):

2.5 A

Maximum Drain-Source On Resistance:

2.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

10 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FDD3N50NZTM Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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