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BLF7G27L-135,118

NXP Semiconductors

BLF7G27L-135,118 by NXP Semiconductors

BLF7G27L-135,118 by NXP Semiconductors is an N-channel enhancement mode FET ideal for high-power applications. It supports a max drain current of 28 A and operates up to 200 °C, making it suitable for demanding environments. This transistor excels in RF amplification and switching tasks.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Vyrian

USA . 6,558 parts In-Stock

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Digiode

USA . 4,359 parts In-Stock

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Anansix

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AZTECH Wire

Italy . 741 parts In-Stock

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$19.350

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One Stop Electronics

USA . 1,034 parts In-Stock

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$52.050

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Component Stockers USA

USA . 767 parts In-Stock

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$99.990

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QUARKTWIN TECHNOLOGY LTD

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UNI Independent Distributors

Spain . 7,845 parts In-Stock

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Corphita

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Northwest PG Solutions

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Native Components

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Overview

Elevate your projects with the BLF7G27L-135,118 from NXP Semiconductors, a trusted leader in innovative solutions. This powerful N-channel FET combines exceptional durability and efficiency, ensuring peak performance even in high-temperature environments. Ideal for demanding applications, it delivers reliability and precision, making it perfect for industrial, automotive, and consumer electronics. Unlock new possibilities and boost your designs today!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher electron mobility, making them efficient for high-speed and high-frequency applications, which enhances the overall performance of electronic circuits.

Configuration: SINGLE

A single configuration implies a simpler design, which can reduce manufacturing costs and complexity in circuit assembly, making this FET an economical choice for various applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are normally off, consuming less power in idle states, which leads to better energy efficiency in applications that only require power when needed.

Maximum Drain Current (Abs) (ID): 28 A

With a maximum drain current of 28 A, this FET can handle substantial loads, making it suitable for high-power applications without the risk of overheating or failure.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for high integration density, lower power consumption, and greater robustness, making this FET ideal for modern electronic and digital circuit designs.

Maximum Operating Temperature: 200 °C

A maximum operating temperature of 200 °C indicates superior thermal stability, allowing the FET to function in harsh environments without degradation, which enhances its reliability in critical applications.

Maximum Drain Current (ID): 28 A

This redundancy in the specification reinforces the device's capability to support demanding applications while ensuring consistency in performance metrics.

Technical Specifications

Power Field Effect Transistors (FET) BLF7G27L-135,118 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

28 A

Maximum Drain Current (ID):

28 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Trade Compliance

BLF7G27L-135,118 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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