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BLF7G21LS-160P

NXP Semiconductors

BLF7G21LS-160P by NXP Semiconductors

BLF7G21LS-160P by NXP is an N-channel RF power FET designed for amplifier applications, featuring a max drain current of 32.5 A and a breakdown voltage of 65 V. Its flatpack design ensures efficient surface mounting. Ideal for S-band operations, it excels in high-frequency performance.

Median Price

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Lifecycle Status

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5

In-Stock Inventory

1k+

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Anansix

USA . 2,165 parts In-Stock

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Vyrian

USA . 2,088 parts In-Stock

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Digiode

USA . 1,182 parts In-Stock

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Connector Distribution Corp

USA . 2 parts In-Stock

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Right Parts Inc.

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Native Components

USA . 320 parts In-Stock

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$0.128

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Northwest PG Solutions

USA . 316 parts In-Stock

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$0.141

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One Stop Electronics

USA . 1,622 parts In-Stock

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$6.050

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A-Z Elektronik GmbH

Germany . 4,997 parts In-Stock

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Corphita

USA . 4,851 parts In-Stock

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UNI Independent Distributors

Spain . 4,218 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,331 parts In-Stock

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Metaverse IC Inc.

Canada . 600 parts In-Stock

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Perfect Parts

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Kepictronics

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Overview

Elevate your RF applications with the BLF7G21LS-160P from NXP Semiconductors, a leader in innovation and quality. This robust N-channel FET delivers exceptional performance as an amplifier, ensuring reliability and efficiency in the S-band frequency range. Designed for seamless integration, its ceramic and metal-sealed construction guarantees durability while enhancing system performance. Choose the BLF7G21LS-160P to unlock superior power handling and make your projects stand out!

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED COFIRED

The ceramic, metal-sealed package ensures high durability and excellent thermal conductivity, making it suitable for high-power applications.

Polarity or Channel Type: N-CHANNEL

The N-channel design offers better efficiency in switching and amplification, which is critical for RF applications.

Configuration: COMMON SOURCE, 2 ELEMENTS

This configuration provides a high gain for amplifying RF signals, making it ideal for various RF applications.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this transistor excels in boosting signal strength in RF circuits.

Surface Mount: YES

Surface mount capability allows for compact design and ease of integration into modern PCB layouts.

Minimum DS Breakdown Voltage: 65 V

With a minimum breakdown voltage of 65V, this FET is well-suited for high-voltage applications, ensuring reliability.

Package Shape: RECTANGULAR

The rectangular shape provides a stable footprint, facilitating better alignment and performance in RF circuits.

Terminal Form: FLAT

Flattened terminals enhance soldering efficiency and improve electrical contact quality on the PCB.

Operating Mode: ENHANCEMENT MODE

The enhancement mode provides low power consumption during operation, increasing efficiency for battery-powered applications.

Highest Frequency Band: S BAND

Operating in the S band makes this FET ideal for communications and radar applications in the 2-4 GHz range.

No. of Elements: 2

Having two elements allows for parallel operation, enhancing overall performance and output power.

No. of Terminals: 4

The four-terminal design allows for versatile connections and simplified circuit integration.

Package Style (Meter): FLATPACK

The flatpack style promotes more efficient heat dissipation, leading to improved performance and reliability in RF applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables high speed and efficiency, making this FET well-suited for modern high-frequency RF applications.

Transistor Element Material: SILICON

Silicon material supports high-temperature operation and good electrical performance, ensuring longevity and reliability.

Maximum Drain Current (ID): 32.5 A

A maximum drain current of 32.5A allows this FET to handle substantial power levels, making it suitable for high-power amplifiers.

Terminal Position: DUAL

Dual terminal position enhances stability and flexibility in circuit design, accommodating diverse applications.

Case Connection: SOURCE

A source case connection simplifies the circuit design and reduces parasitic effects, improving overall device performance.

Technical Specifications

RF Power Field Effect Transistors (FET) BLF7G21LS-160P attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

65 V

Maximum Drain Current (ID):

32.5 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

S BAND

JESD-30 Code:

R-CDFP-F4

Moisture Sensitivity Level (MSL):

NOT APPLICABLE

No. of Elements:

2

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLATPACK

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BLF7G21LS-160P Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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