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BLF7G10LS-250

NXP Semiconductors

BLF7G10LS-250 by NXP Semiconductors

BLF7G10LS-250 by NXP Semiconductors is an N-channel RF power FET designed for amplifier applications. It features a 65V min breakdown voltage, operates in the ultra-high frequency band, and supports a max drain current of 56A. This flatpack device ensures efficient performance in compact designs.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Digiode

USA . 1,836 parts In-Stock

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Anansix

USA . 1,281 parts In-Stock

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Vyrian

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Native Components

USA . 54 parts In-Stock

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$0.218

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Northwest PG Solutions

USA . 711 parts In-Stock

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$0.240

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One Stop Electronics

USA . 253 parts In-Stock

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$34.050

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Authorized Procurement Solutions

USA . 404,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,898 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,932 parts In-Stock

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UNI Independent Distributors

Spain . 2,911 parts In-Stock

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Corphita

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Perfect Parts

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Kepictronics

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Overview

Unlock unparalleled performance with the BLF7G10LS-250 from NXP Semiconductors, a leader in innovative RF solutions. This robust N-channel FET excels as an amplifier in ultra-high frequency applications, delivering exceptional efficiency and reliability. With its ceramic, metal-sealed package, it’s built for durability, making it perfect for demanding environments. Experience unmatched quality and value that enhances your designs and drives your success!

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED COFIRED

The ceramic and metal-sealed body material provides excellent thermal stability and durability, making this FET suitable for high-performance applications.

Polarity or Channel Type: N-CHANNEL

The N-channel configuration allows for efficient electron flow, resulting in higher performance and lower energy losses in amplification applications.

Configuration: SINGLE

A single configuration simplifies circuit design and reduces the potential for interference, ensuring reliable and consistent performance.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this FET can effectively enhance signal strength for a variety of applications, making it versatile and reliable.

Surface Mount: YES

Being surface mount compatible allows for easier integration into modern circuit designs, saving space and reducing assembly costs.

Minimum DS Breakdown Voltage: 65 V

With a high minimum breakdown voltage, this FET can withstand significant voltage stresses, increasing reliability in demanding applications.

Package Shape: RECTANGULAR

The rectangular shape facilitates efficient layout and thermal management in printed circuit boards, optimizing overall performance.

Terminal Form: FLAT

The flat terminal form ensures secure and stable connections, enhancing the overall durability of the device in a circuit.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides better control over the transistor's performance characteristics, making it more versatile for different applications.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Operating in the ultra-high frequency band makes this FET ideal for high-speed applications, such as RF communication and broadcasting.

No. of Terminals: 2

With only two terminals, this FET simplifies circuit design and reduces the complexity of integration in various electronic devices.

Package Style (Meter): FLATPACK

The flatpack style promotes low-profile design, allowing for compact implementations in various electronic applications without sacrificing performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers advantages such as low on-resistance and high speed, enhance performance in high-frequency amplification scenarios.

Transistor Element Material: SILICON

Silicon as a material ensures good electrical performance and thermal conductivity, contributing to the overall efficiency and reliability of the FET.

Maximum Drain Current (ID): 56 A

A high maximum drain current allows this FET to handle substantial power levels, making it suitable for high-demand amplification applications.

Terminal Position: DUAL

The dual terminal position enhances circuit design flexibility, enabling various configurations and arrangements for optimal performance.

Case Connection: SOURCE

Having the source connected to the case helps in effective heat dissipation, enhancing the operational longevity of the FET.

Technical Specifications

RF Power Field Effect Transistors (FET) BLF7G10LS-250 attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

65 V

Maximum Drain Current (ID):

56 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-CDFP-F2

Moisture Sensitivity Level (MSL):

NOT APPLICABLE

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLATPACK

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BLF7G10LS-250 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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