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BF966

NXP Semiconductors

BF966 by NXP Semiconductors

BF966 by NXP Semiconductors is an N-channel RF FET designed for ultra-high frequency applications. It features a 20V min breakdown voltage, dual gate operation, and comes in a ceramic, metal-sealed package. Ideal for RF amplification in compact devices.

Median Price

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Lifecycle Status

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11

In-Stock Inventory

1k+

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Digiode

USA . 4,437 parts In-Stock

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Anansix

USA . 1,620 parts In-Stock

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Holdelec - ElecDif-Pro

France . 488 parts In-Stock

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Manotoh

Italy . 416 parts In-Stock

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Vyrian

USA . 116 parts In-Stock

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LittleDiode

UK . 103 parts In-Stock

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Huijzer Components

Netherlands . 49 parts In-Stock

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Corel Iberica Componentes, S.L.

Spain . 25 parts In-Stock

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Fibra_Brandt Electronic GMBH

Germany . 24 parts In-Stock

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GES GmbH

Germany . 12 parts In-Stock

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Digital Electronic Gebert Verwaltungs UG

Germany . 2 parts In-Stock

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Native Components

USA . 292 parts In-Stock

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$1.126

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Northwest PG Solutions

USA . 1,715 parts In-Stock

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$1.239

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One Stop Electronics

USA . 555 parts In-Stock

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$33.050

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UNI Independent Distributors

Spain . 6,333 parts In-Stock

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Corphita

USA . 1,554 parts In-Stock

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Assy Fe

Spain . 38 parts In-Stock

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Overview

Elevate your designs with the BF966 by NXP Semiconductors, a leading name in innovation and reliability. This N-channel RF Small Signal FET is engineered for peak performance in ultra-high frequency applications, ensuring superior signal clarity and efficiency. With its durable ceramic and metal-sealed package, you gain unmatched stability and longevity. Experience the precision and quality that comes from a trusted manufacturer, empowering your projects to stand out in today's competitive landscape.

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED COFIRED

The ceramic, metal-sealed construction ensures robust durability and resistance to environmental factors, making the product suitable for reliable long-term applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically exhibit better performance and efficiency in high-speed applications, contributing to faster switching speeds and lower ON resistance.

Configuration: SINGLE

A single configuration simplifies circuit designs, making integration into existing systems easier and more efficient.

Surface Mount: YES

Surface mount technology enables compact design, allowing for high-density assembly and better performance in miniaturized electronic products.

Minimum DS Breakdown Voltage: 20 V

A minimum breakdown voltage of 20 V enhances the safety margins in various applications, providing reliability in high-voltage environments.

Package Shape: ROUND

The round package shape can facilitate efficient heat dissipation, improving thermal management in usage scenarios.

Terminal Form: FLAT

Flat terminals improve mechanical stability and ease of soldering, ensuring reliable connections in circuit board assembly.

Operating Mode: DUAL GATE, DEPLETION MODE

The dual gate, depletion mode operation allows for enhanced control over the current flow, making it ideal for applications requiring precise signal processing.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Being suitable for ultra-high frequency applications means this FET can handle high-speed signals, making it particularly effective in RF and communication systems.

No. of Terminals: 4

Four terminals provide flexibility in circuit design, enabling various configurations and functionalities to accommodate different application needs.

Package Style (Meter): DISK BUTTON

The disk button package style is conducive to stable mounting and heat dissipation, enhancing the device's reliability during operation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enhances the efficiency and scalability of the FET, making it a suitable choice for modern electronic applications requiring high performance.

Transistor Element Material: SILICON

Silicon is a widely used semiconductor material that provides a good balance of performance, cost, and thermal characteristics, ensuring reliability across a range of applications.

Terminal Position: RADIAL

Radial terminal positioning allows for efficient layout and routing on circuit boards, facilitating compact designs without sacrificing connectivity.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF966 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Minimum DS Breakdown Voltage:

20 V

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

O-CRDB-F4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, DEPLETION MODE

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

ROUND

Package Style (Meter):

DISK BUTTON

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

RADIAL

Transistor Element Material:

SILICON

Trade Compliance

BF966 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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