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BF909WR,135

NXP Semiconductors

BF909WR,135 by NXP Semiconductors

BF909WR,135 by NXP Semiconductors is an N-channel MOSFET designed for surface mount applications. It supports a max drain current of 0.04 A and operates up to 150 °C, making it ideal for power management in compact electronic devices. Its tin terminal finish ensures reliable connections.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 5,731 parts In-Stock

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Digiode

USA . 2,955 parts In-Stock

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Anansix

USA . 773 parts In-Stock

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One Stop Electronics

USA . 626 parts In-Stock

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$1.050

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Native Components

USA . 366 parts In-Stock

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$1.680

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Northwest PG Solutions

USA . 1,645 parts In-Stock

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$1.848

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AZTECH Wire

Italy . 521 parts In-Stock

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UNI Independent Distributors

Spain . 8,345 parts In-Stock

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Corphita

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Microchip USA

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Overview

Elevate your designs with the BF909WR,135 from NXP Semiconductors, a trusted leader in innovation. This N-channel Power FET delivers exceptional reliability and efficiency, perfect for a variety of applications ranging from RF amplifiers to signal processing. Experience unmatched performance and thermal stability that ensures longevity and reduces costs. Trust in NXP's dedication to quality and innovation, empowering you to create cutting-edge solutions with confidence.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their high efficiency and superior performance in switching applications, making this product an excellent choice for various electronic circuits.

Configuration: SINGLE

A single configuration allows for simple design integration, providing flexibility and ease of use in various applications.

Surface Mount: YES

Surface mount technology allows for compact designs and is well-suited for automated assembly, enhancing reliability and reducing production costs.

Maximum Drain Current (Abs) (ID): 0.04 A

With a maximum drain current of 0.04 A, this FET is suitable for low-power applications, ensuring efficiency and thermal management.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The MOS technology provides high input impedance and fast switching speeds, making this product ideal for a range of digital and analog circuits.

Maximum Operating Temperature: 150 °C

A high operating temperature of 150 °C ensures reliability in demanding environments, making this FET suitable for industrial and automotive applications.

Terminal Finish: Tin (Sn)

The tin terminal finish improves solderability and reliability, ensuring a strong electrical connection and reducing the risk of failure in critical applications.

Maximum Drain Current (ID): 0.04 A

The repeated specification of a maximum drain current of 0.04 A underscores its consistency and suitability for low-power conditions in various circuit designs.

Technical Specifications

Power Field Effect Transistors (FET) BF909WR,135 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.04 A

Maximum Drain Current (ID):

.04 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Trade Compliance

BF909WR,135 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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