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BF1207,115

NXP Semiconductors

BF1207,115 by NXP Semiconductors

NXP Semiconductors' BF1207,115 is a N-CHANNEL RF FET with 6V DS breakdown voltage and 21dB power gain. Ideal for amplifier applications in UHF band, it operates in dual gate enhancement mode with 0.03A max drain current and 0.18W power dissipation.

Median Price

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Lifecycle Status

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6

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1k+

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Chip Stock

USA . 70,000 parts In-Stock

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Vyrian

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Digiode

USA . 4,723 parts In-Stock

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Anansix

USA . 2,499 parts In-Stock

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Nova Conductors

Japan . 50 parts In-Stock

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AZTECH Wire

Italy . 327 parts In-Stock

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$18.474

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One Stop Electronics

USA . 1,419 parts In-Stock

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$37.050

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Ampacity Inc.

Singapore . 198 parts In-Stock

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$54.050

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Spain . 1,027 parts In-Stock

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Microchip USA

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Overview

Enhance your RF amplifier projects with the BF1207,115 by NXP Semiconductors. Trusted for its quality and reliability, this N-CHANNEL FET offers superior performance in ultra-high frequency applications. With a power gain of 21 dB and a compact gull wing package design, this transistor provides exceptional value for your amplifier designs. Whether you're working on communications systems or radar applications, the BF1207,115 delivers the power and efficiency you need to take your projects to the next level. Experience the difference with NXP Semiconductors.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection to the internal components of the transistor.

Polarity or Channel Type: N-CHANNEL

Allows for efficient conduction of current in the specified direction.

Minimum DS Breakdown Voltage: 6 V

Ensures reliable operation within specified voltage limits.

Minimum Power Gain (Gp): 21 dB

Provides efficient amplification of signals with minimal loss.

Surface Mount: YES

Facilitates easy and compact integration into circuit boards.

Maximum Operating Temperature: 150 °C

Can withstand high temperatures without compromising performance.

Transistor Element Material: SILICON

Known for its reliability and efficiency in semiconductor devices.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF1207,115 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Additional Features:

LOW NOISE

Case Connection:

ISOLATED

Configuration:

Minimum DS Breakdown Voltage:

6 V

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G6

JESD-609 Code:

e3

No. of Elements:

2

No. of Terminals:

6

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Minimum Power Gain (Gp):

21 dB

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BF1207,115 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.21.00.75

SB

8541.21.00.80

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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