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MT41K256M16HA-125AIT:E

Micron Technology

MT41K256M16HA-125AIT:E by Micron Technology

Micron Technology's MT41K256M16HA-125AIT:E is a DDR3L DRAM with 256MX16 organization, operating at 1.35V. It features synchronous mode, self-refresh capability, and multi-bank page burst access for high-performance applications in automotive electronics.

Median Price

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Lifecycle Status

Suppliers In-Stock

9

In-Stock Inventory

1k+

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Vyrian

USA . 6,130 parts In-Stock

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Digiode

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Sunrise Surplus Inc.

USA . 23 parts In-Stock

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Nova Conductors

Japan . 15 parts In-Stock

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QIE Inc.

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ComSIT Distribution GmbH

Germany . 10 parts In-Stock

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LWI Electronics Inc

India . 5 parts In-Stock

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PC Components Company LLC

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Bristol Electronics

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Distributors (Availability)

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Aztec Data Supply Inc.

USA . 4,122 parts In-Stock

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$3.411

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Corohmni

South Africa . 108 parts In-Stock

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$5.938

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Ampacity Inc.

Singapore . 487 parts In-Stock

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$7.000

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AZTECH Wire

Italy . 645 parts In-Stock

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Semicontronic

India . 262 parts In-Stock

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$27.000

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$26.325

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$26.190

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A-Z Elektronik GmbH

Germany . 6,947 parts In-Stock

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Futuretech Components

Singapore . 2,598 parts In-Stock

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Authorized Procurement Solutions

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Continental Prestige Electronics

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Corphita

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RC Electronics

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Perfect Parts

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Argo Parts USA

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Microchip USA

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Kepictronics

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Computer Components Inc. - USA

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Bastille Electronics

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Overview

Experience the superior quality and performance of Micron Technology's MT41K256M16HA-125AIT:E DDR3L DRAM. This cutting-edge memory solution offers unparalleled reliability and efficiency, making it perfect for a wide range of applications. With a nominal supply voltage of 1.35V and self-refresh capability, this memory module delivers optimal power savings without compromising on speed or responsiveness. Upgrade your system with Micron's DDR3L DRAM and unlock a whole new level of performance and productivity.

Feature Benefit Bullets

Package Body Material

PLASTIC/EPOXY - This material offers durability and cost-effectiveness, making it a practical choice.

Surface Mount

YES - Allows for easy and efficient installation on PCBs, increasing productivity.

Screening Level

AEC-Q100 - Ensures high quality and reliability for automotive applications.

Package Shape

RECTANGULAR - Enables efficient use of space on the PCB.

Operating Mode

SYNCHRONOUS - Provides faster and more synchronized data transfer, enhancing performance.

Self Refresh

YES - Allows for power-saving capabilities, ideal for energy-efficient systems.

Nominal Supply Voltage / Vsup (V)

1.35 - Optimal voltage level for stable and reliable operation.

No. of Terminals

96 - Sufficient terminals for connecting to the system, ensuring proper functioning.

Package Style (Meter)

GRID ARRAY, THIN PROFILE, FINE PITCH - Space-efficient design for compact devices.

Organization

256MX16 - Offers a balanced configuration for efficient data storage and retrieval.

Terminal Position

BOTTOM - Easy accessibility and connection to the system for seamless integration.

Maximum Seated Height

1.2 mm - Low profile design for compact and slim devices.

Width

9 mm - Compact size for space-constrained applications.

Minimum Supply Voltage (Vsup)

1.283 V - Allows for stable operation even at low voltage levels.

Length

14 mm - Suitable size for various PCB layouts and designs.

Access Mode

MULTI BANK PAGE BURST - Faster data access and transfer speeds for improved performance.

Technology

CMOS - Offers low power consumption and high speed operation, ideal for various applications.

Terminal Form

BALL - Provides reliable connections for secure data transfer.

No. of Words

268435456 words - Large storage capacity for handling extensive data requirements.

Memory Width

16 - Efficient data handling capabilities with a wide memory width.

Terminal Pitch

0.8 mm - Fine pitch design for high-density layouts and space optimization.

No. of Words Code

256M - Simplifies memory organization and management for easy scalability.

Maximum Supply Voltage (Vsup)

1.45 V - Provides a safe voltage range for stable performance and longevity.

Memory Density

4294967296 bit - High memory density for handling large amounts of data efficiently.

Memory IC Type

DDR3L DRAM - Offers high-speed data transfer rates and compatibility with various systems.

Technical Specifications

DRAM MT41K256M16HA-125AIT:E attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

MULTI BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH

JESD-30 Code:

R-PBGA-B96

Length:

14 mm

Memory Density:

4294967296 bit

Memory IC Type:

Memory Width:

16

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

96

No. of Words:

268435456 words

No. of Words Code:

256M

Operating Mode:

SYNCHRONOUS

Organization:

256MX16

Package Body Material:

PLASTIC/EPOXY

Package Code:

Package Shape:

Package Style (Meter):

GRID ARRAY, THIN PROFILE, FINE PITCH

Screening Level:

AEC-Q100

Maximum Seated Height:

1.2 mm

Self Refresh:

YES

Maximum Supply Voltage (Vsup):

1.45 V

Minimum Supply Voltage (Vsup):

1.283 V

Nominal Supply Voltage / Vsup (V):

1.35

Surface Mount:

YES

Technology:

CMOS

Terminal Form:

BALL

Terminal Pitch:

.8 mm

Terminal Position:

BOTTOM

Width:

9 mm

Trade Compliance

MT41K256M16HA-125AIT:E Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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