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STW14NM65N

STMicroelectronics

STW14NM65N by STMicroelectronics

STW14NM65N by STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a 650V breakdown voltage, 12A max drain current, and 125W power dissipation. Ideal for high-efficiency circuits in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

7

In-Stock Inventory

1k+

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Vyrian

USA . 5,404 parts In-Stock

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Digiode

USA . 1,892 parts In-Stock

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Anansix

USA . 899 parts In-Stock

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Elcom Components

USA . 510 parts In-Stock

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ACDS - Activité Composants Distribution Service

France . 60 parts In-Stock

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Bristol Electronics

USA . 60 parts In-Stock

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Dan-Mar Components

USA . 60 parts In-Stock

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,809 parts In-Stock

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$0.374

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$0.336

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MKK Technologies

India . 502 parts In-Stock

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$0.702

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DigiPath Technology Company

USA . 502 parts In-Stock

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$0.702

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AZTECH Wire

Italy . 1,016 parts In-Stock

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$16.730

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Alle Elektronik GmbH

Germany . 4,140 parts In-Stock

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Corphita

USA . 3,391 parts In-Stock

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Parana Technologies

USA . 708 parts In-Stock

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Perfect Parts

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Overview

Elevate your designs with the STW14NM65N from STMicroelectronics, a powerhouse in power FET technology. Renowned for its reliable performance and longevity, this N-channel transistor excels in switching applications, delivering efficiency you can trust. With its robust construction and built-in diode, it supports high voltage operations while ensuring minimal heat generation. Experience the reliability and innovation that STMicroelectronics is known for, paving the way for enhanced efficiency in your projects.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The durable plastic/epoxy construction ensures reliability and longevity in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are often preferred for high-speed switching applications due to their lower on-resistance.

Configuration: SINGLE WITH BUILT-IN DIODE

This configuration enhances protection and simplifies circuit design by integrating a diode directly into the package.

Transistor Application: SWITCHING

Optimized for switching applications, this FET provides effective control over electrical devices, improving efficiency.

Minimum DS Breakdown Voltage: 650 V

A high breakdown voltage makes this FET suitable for high-voltage applications, ensuring stability and safety.

Package Shape: RECTANGULAR

The rectangular shape allows for easy integration into various circuit designs, optimizing space utilization.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical stability and ease of soldering for reliable connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for higher efficiency and better control over the device's performance.

Maximum Pulsed Drain Current (IDM): 48 A

The ability to handle high pulsed currents makes this FET suitable for applications requiring substantial power.

Avalanche Energy Rating (EAS): 300 mJ

A high avalanche energy rating provides protection against transient voltage spikes, enhancing circuit reliability.

Maximum Drain Current (Abs) (ID): 12 A

A maximum drain current of 12 A allows for robust performance in moderate power levels, suitable for many applications.

No. of Terminals: 3

The three-terminal configuration allows for simple circuit designs while maintaining essential functionality.

Maximum Power Dissipation (Abs): 125 W

This high power dissipation capability enables the FET to operate effectively in demanding environments.

Package Style (Meter): FLANGE MOUNT

Flange mount style provides additional mechanical stability, making it easier to mount securely in different setups.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for high input impedance and low power consumption, ideal for battery-operated devices.

Maximum Operating Temperature: 150 °C

A high operating temperature rating ensures this FET can function in challenging thermal conditions, enhancing durability.

Transistor Element Material: SILICON

Silicon is a widely used material in FETs, ensuring good thermal stability and efficient performance.

Terminal Finish: Matte Tin (Sn)

The matte tin finish improves solderability and corrosion resistance, enhancing long-term reliability.

Maximum Drain Current (ID): 12 A

This specification is reiterated to emphasize its capacity to handle significant current, suitable for various applications.

Maximum Drain-Source On Resistance: 0.38 ohm

Low on-resistance minimizes heat generation during operation, improving efficiency and performance.

Terminal Position: SINGLE

A single terminal position simplifies layout in circuit boards, making it easier to integrate into designs.

Technical Specifications

Power Field Effect Transistors (FET) STW14NM65N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

300 mJ

Minimum DS Breakdown Voltage:

650 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.38 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

48 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW14NM65N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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