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STU5N52K3

STMicroelectronics

STU5N52K3 by STMicroelectronics

STU5N52K3 from STMicroelectronics is an N-channel FET ideal for switching applications. It features a 525V breakdown voltage, 4.4A max drain current, and operates at up to 150 °C. This versatile transistor is suitable for various power management tasks.

Median Price

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Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

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EBV Elektronik

Germany . 50 parts In-Stock

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50

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ComSIT Distribution GmbH

Germany . 10,500 parts In-Stock

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10,500

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Vyrian

USA . 8,631 parts In-Stock

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8,631

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Digiode

USA . 2,910 parts In-Stock

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Flip Electronics

USA . 1,200 parts In-Stock

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Anansix

USA . 1,031 parts In-Stock

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IDEA Electronic Components Group

UK . 1,014 parts In-Stock

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$0.312

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$0.281

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$0.312

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$0.281

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MKK Technologies

India . 200 parts In-Stock

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$0.586

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$0.586

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DigiPath Technology Company

USA . 200 parts In-Stock

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$0.586

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$0.586

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Advanced Electronics

New Zealand . 85 parts In-Stock

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$1.089

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$0.991

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$0.893

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85

$1.089

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$0.893

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AZTECH Wire

Italy . 165 parts In-Stock

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$19.870

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Perfect Parts

USA . 12,337 parts In-Stock

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Kepictronics

USA . 5,000 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,995 parts In-Stock

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Corphita

USA . 4,473 parts In-Stock

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Authorized Procurement Solutions

USA . 1,500 parts In-Stock

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GreenTree Electronics

Israel . 1,100 parts In-Stock

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Parana Technologies

USA . 73 parts In-Stock

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$0.373

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$0.373

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Overview

Unlock superior performance with the STU5N52K3 from STMicroelectronics, a leading name in semiconductor innovation. This powerful N-channel FET is designed for seamless switching applications, delivering outstanding efficiency and reliability. Its robust construction ensures durability even in demanding environments, making it perfect for industrial automation, power supplies, and automotive systems. Experience unmatched quality and versatility that drives your projects forward with confidence!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of durable plastic/epoxy material ensures good protection and longevity of the transistor in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient and provide better performance for switching applications compared to P-channel FETs.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies the design and enhances reliability by providing intrinsic flyback protection.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can handle fast switching speeds, making it ideal for various electronic circuits.

Minimum DS Breakdown Voltage: 525 V

A high breakdown voltage allows the FET to operate safely in high-voltage applications, enhancing its versatility.

Package Shape: RECTANGULAR

The rectangular package shape allows for easy manual handling and efficient PCB layout, maximizing space utilization.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide strong electrical connections and are ideal for high-power applications, improving circuit reliability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for greater control of the device, making it suitable for low-power applications requiring precision control.

Maximum Pulsed Drain Current (IDM): 17.6 A

A high pulsed drain current capability makes this FET suitable for demanding applications that experience short spikes in current.

Maximum Drain Current (Abs) (ID): 4.4 A

This level of maximum drain current enables adequate performance in typical applications without risking damage.

No. of Terminals: 3

The three-terminal design simplifies circuit design and layout, making it easier to integrate into various applications.

Maximum Power Dissipation (Abs): 70 W

High maximum power dissipation allows the FET to operate efficiently at higher power levels without overheating.

Package Style (Meter): IN-LINE

The in-line package style enhances ease of assembly and minimizes space requirements on PCBs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high efficiency and fast switching capabilities, making it ideal for modern electronic applications.

Maximum Operating Temperature: 150 °C

A high operating temperature rating extends the range of environments in which the FET can operate safely.

Transistor Element Material: SILICON

Silicon as a semiconductor material ensures good electrical characteristics and stability under various operating conditions.

Maximum Drain Current (ID): 4.4 A

This specification confirms robust current handling, allowing for reliable performance in applications with varying load conditions.

Maximum Drain-Source On Resistance: 1.5 ohm

Low on-resistance minimizes power losses during operation, improving overall circuit efficiency.

Terminal Position: SINGLE

A single terminal position simplifies PCB layout and design, making it versatile for many configurations.

Technical Specifications

Power Field Effect Transistors (FET) STU5N52K3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Minimum DS Breakdown Voltage:

525 V

Maximum Drain Current (Abs) (ID):

4.4 A

Maximum Drain Current (ID):

4.4 A

Maximum Drain-Source On Resistance:

1.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

17.6 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STU5N52K3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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