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STS2NF100

STMicroelectronics

STS2NF100 by STMicroelectronics

STS2NF100 by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a 100V breakdown voltage, 8A max pulsed drain current, and operates at up to 175 °C. Ideal for compact power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,395 parts In-Stock

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3,395

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Anansix

USA . 2,581 parts In-Stock

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2,581

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Digiode

USA . 788 parts In-Stock

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788

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,008 parts In-Stock

1+ parts

$1.694

100+ parts

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1k+ parts

$1.524

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1,008

$1.694

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$1.524

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MKK Technologies

India . 24 parts In-Stock

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$3.185

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24

$3.185

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DigiPath Technology Company

USA . 24 parts In-Stock

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$3.185

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24

$3.185

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Kepictronics

USA . 10,095 parts In-Stock

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10,095

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Corphita

USA . 2,374 parts In-Stock

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2,374

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Authorized Procurement Solutions

USA . 1,500 parts In-Stock

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1,500

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Parana Technologies

USA . 773 parts In-Stock

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$2.025

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773

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$2.025

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Overview

Unlock the power of efficiency with the STS2NF100 from STMicroelectronics, your trusted partner in cutting-edge semiconductor solutions. This robust N-channel Power FET is engineered for seamless switching applications, boasting a built-in diode that enhances reliability and reduces design complexity. Ideal for diverse industries, from automotive to industrial automation, its compact size and exceptional performance elevate your projects while minimizing energy consumption. Experience unmatched quality and innovation today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy construction enhances durability and reliability, making it suitable for a wide range of applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors generally provide better efficiency and faster switching speeds, ideal for high-performance switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies the circuit design and provides added protection against voltage spikes.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers high-speed operations critical for modern electronic devices.

Surface Mount: YES

Surface mount capability allows for easier integration into compact circuit designs, enhancing overall performance and reliability.

Minimum DS Breakdown Voltage: 100 V

With a minimum breakdown voltage of 100V, this FET can handle high voltage applications, ensuring safe operation in demanding environments.

Package Shape: RECTANGULAR

The rectangular shape optimizes space utilization and thermal dissipation on printed circuit boards (PCBs).

Terminal Form: GULL WING

Gull wing terminals improve soldering reliability and are compatible with automated assembly processes.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low standby power consumption, making it energy-efficient for various applications.

Maximum Pulsed Drain Current (IDM): 8 A

An IDM of 8A allows the FET to handle significant load currents, making it suitable for demanding power applications.

Avalanche Energy Rating (EAS): 200 mJ

The high avalanche energy rating indicates robustness against transient voltage spikes, enhancing reliability in harsh conditions.

Maximum Drain Current (Abs) (ID): 2 A

A maximum drain current of 2A ensures it can manage moderate loads effectively, enabling many circuit designs.

No. of Terminals: 8

The 8-terminal configuration provides ample connections for circuit integration, supporting complex applications.

Maximum Power Dissipation (Abs): 2.5 W

With 2.5W power dissipation capability, this FET can operate efficiently without overheating, which is critical for longevity.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves PCB space and enables higher density circuit designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The MOSFET technology used ensures fast switching times, low on-resistance, and excellent thermal stability.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature of 175 °C allows this FET to perform reliably in very high-temperature environments.

Transistor Element Material: SILICON

Silicon as the material choice provides good electrical characteristics and thermal stability for optimal performance.

Maximum Drain Current (ID): 2 A

A consistent maximum drain current rating of 2A highlights reliability and predictability in performance under load.

Maximum Drain-Source On Resistance: 0.26 ohm

Low on-resistance of 0.26 ohms ensures higher efficiency during operation, minimizing power loss and heat generation.

Terminal Position: DUAL

Dual terminal positioning enhances the versatility of the component in various circuit layouts.

Technical Specifications

Power Field Effect Transistors (FET) STS2NF100 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

200 mJ

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

2 A

Maximum Drain Current (ID):

2 A

Maximum Drain-Source On Resistance:

.26 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

8 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STS2NF100 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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