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STP200N4F3

STMicroelectronics

STP200N4F3 by STMicroelectronics

STP200N4F3 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 120 A, a breakdown voltage of 40 V, and operates at up to 175 °C. Ideal for high-power circuits, it ensures reliable performance with low on-resistance.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 4,451 parts In-Stock

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Digiode

USA . 1,370 parts In-Stock

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1,370

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Anansix

USA . 907 parts In-Stock

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907

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IDEA Electronic Components Group

UK . 2,095 parts In-Stock

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$1.376

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-

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$1.239

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2,095

$1.376

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$1.239

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MKK Technologies

India . 1,607 parts In-Stock

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$2.588

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DigiPath Technology Company

USA . 1,607 parts In-Stock

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$2.588

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1,607

$2.588

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AZTECH Wire

Italy . 962 parts In-Stock

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$18.900

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962

$18.900

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Component Stockers USA

USA . 744 parts In-Stock

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$99.990

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744

$99.990

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Alle Elektronik GmbH

Germany . 3,988 parts In-Stock

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Parana Technologies

USA . 2,108 parts In-Stock

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$1.646

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$1.646

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Corphita

USA . 1,526 parts In-Stock

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Kepictronics

USA . 500 parts In-Stock

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Overview

Elevate your power management solutions with the STP200N4F3 from STMicroelectronics, a leader in innovative semiconductor technology. This robust N-channel FET combines exceptional switching efficiency and reliability, making it ideal for high-performance applications. With its durable design and impressive current handling capability, customers can trust the STP200N4F3 to enhance system performance while ensuring energy efficiency. Experience unparalleled value and cutting-edge quality to drive your projects forward!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy provides a lightweight and durable housing, ensuring reliable performance and protection against environmental factors.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer better performance characteristics for high-speed switching applications compared to P-channel alternatives.

Configuration: SINGLE WITH BUILT-IN DIODE

The integrated diode simplifies the circuit design and enhances reliability by providing protective functionality.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently handle high-speed operations, ideal for power management tasks.

Minimum DS Breakdown Voltage: 40 V

A minimum breakdown voltage of 40V allows this FET to operate safely in varied applications, providing robust performance.

Package Shape: RECTANGULAR

Rectangular packaging optimizes space in circuit boards, making this component suitable for compact designs.

Terminal Form: THROUGH-HOLE

Through-hole mounting offers reliable electrical connections and mechanical stability, making it well-suited for high-power applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs provide lower on-resistance and higher efficiency in their operational state, enhancing overall performance.

Maximum Pulsed Drain Current (IDM): 480 A

With a pulsed drain current capacity of 480A, this transistor can handle high surge currents, making it ideal for demanding applications.

Avalanche Energy Rating (EAS): 862 mJ

An avalanche energy rating of 862 mJ indicates the FET can tolerate sudden energy pulses, enhancing durability in fluctuating environments.

Maximum Drain Current (Abs) (ID): 120 A

The ability to handle 120A of continuous drain current reinforces this FET's suitability for high-current applications.

No. of Terminals: 3

Having three terminals simplifies circuit integration, allowing for straightforward implementation in various designs.

Maximum Power Dissipation (Abs): 300 W

With a maximum power dissipation of 300W, this FET can effectively manage heat during operation, reducing the risk of thermal failure.

Package Style (Meter): FLANGE MOUNT

Flange mount design ensures robust mechanical stability during assembly, making it easier to secure within various application environments.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers high input impedance and low output capacitance, making it ideal for efficient switching applications.

Maximum Operating Temperature: 175 °C

Operating at a maximum temperature of 175 °C allows this FET to function reliably in high-temperature environments.

Transistor Element Material: SILICON

Silicon is a widely-used material for FETs due to its excellent electrical properties, facilitating robust performance.

Terminal Finish: MATTE TIN

The matte tin terminal finish provides good solderability and corrosion resistance, ensuring long-term reliability in circuit applications.

Maximum Drain Current (ID): 120 A

Reiterating a maximum drain current capacity of 120A provides assurance of the transistor's capability to handle substantial loads.

Maximum Drain-Source On Resistance: 0.0044 ohm

A low on-resistance of 0.0044 ohm minimizes power loss during operation, enhancing energy efficiency and thermal performance.

Terminal Position: SINGLE

Single terminal positioning contributes to the compactness of the design, facilitating easier integration into various applications.

Case Connection: DRAIN

DRAIN case connection allows for straightforward integration into circuits, optimizing performance in power management applications.

Technical Specifications

Power Field Effect Transistors (FET) STP200N4F3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

862 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

120 A

Maximum Drain Current (ID):

120 A

Maximum Drain-Source On Resistance:

.0044 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

480 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP200N4F3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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