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STP185N10F3

STMicroelectronics

STP185N10F3 by STMicroelectronics

STP185N10F3 from STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 120 A, breakdown voltage of 100 V, and power dissipation up to 300 W. Ideal for high-efficiency power management in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,617 parts In-Stock

1+ parts

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3,617

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Digiode

USA . 3,416 parts In-Stock

1+ parts

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3,416

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Anansix

USA . 1,420 parts In-Stock

1+ parts

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1,420

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,645 parts In-Stock

1+ parts

$1.731

100+ parts

-

1k+ parts

$1.557

10k+ parts

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1,645

$1.731

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$1.557

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MKK Technologies

India . 2,129 parts In-Stock

1+ parts

$3.254

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2,129

$3.254

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DigiPath Technology Company

USA . 2,129 parts In-Stock

1+ parts

$3.254

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2,129

$3.254

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Ampacity Inc.

Singapore . 1,494 parts In-Stock

1+ parts

$11.050

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1,494

$11.050

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AZTECH Wire

Italy . 50 parts In-Stock

1+ parts

$22.120

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50

$22.120

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Alle Elektronik GmbH

Germany . 4,974 parts In-Stock

1+ parts

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4,974

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Corphita

USA . 1,352 parts In-Stock

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1,352

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Parana Technologies

USA . 834 parts In-Stock

1+ parts

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100+ parts

$2.069

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834

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$2.069

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Overview

Experience unparalleled performance and reliability with the STP185N10F3 from STMicroelectronics, a leader in semiconductor innovation. This N-channel power FET excels in switching applications, delivering exceptional efficiency and robust power management. With a focus on quality and durability, it operates flawlessly even under demanding conditions, making it ideal for industrial automation, automotive systems, and more. Upgrade your projects with confidence, knowing you have the backing of a trusted manufacturer.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material offers excellent durability and protection against environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel configurations provide higher efficiency and lower on-resistance, which is advantageous in power management and switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode ensures reverse polarity protection and simplifies circuit designs, reducing the need for additional components.

Transistor Application: SWITCHING

Designed for switching applications, this FET excels at fast on/off operations, making it ideal for power regulation tasks.

Minimum DS Breakdown Voltage: 100 V

A minimum breakdown voltage of 100 V offers reliable operation in high-voltage environments, enhancing the transistor's versatility.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient space utilization on PCBs, facilitating compact designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical connections and are suitable for high-power applications, ensuring reliability.

Operating Mode: ENHANCEMENT MODE

The enhancement mode operation improves the device's performance under specific conditions, enhancing its suitability for various applications.

Maximum Pulsed Drain Current (IDM): 480 A

With a pulsed drain current capability of 480 A, this FET can handle peak loads effectively, making it ideal for demanding applications.

Maximum Drain Current (Abs) (ID): 120 A

A maximum drain current of 120 A allows for substantial power handling, ideal for high-current applications.

No. of Terminals: 3

The 3-terminal configuration simplifies designs while providing essential functionalities necessary for efficient operation.

Maximum Power Dissipation (Abs): 300 W

The ability to dissipate up to 300 W of power ensures that the FET can operate efficiently without overheating, thus enhancing reliability.

Package Style (Meter): FLANGE MOUNT

Flange mount packaging facilitates secure mounting and enhances thermal conductivity, further ensuring stable operation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology contributes to faster switching speeds and lower power consumption, making it an excellent choice for modern electronics.

Maximum Operating Temperature: 175 °C

With a maximum operating temperature of 175 °C, this FET can function reliably in high-temperature environments, broadening its application range.

Transistor Element Material: SILICON

Silicon as the element material ensures high performance and stability, providing a solid foundation for effective power management.

Maximum Drain Current (ID): 120 A

This specification reaffirms the FET's robustness in handling significant currents, suitable for high-demand applications.

Maximum Drain-Source On Resistance: 0.0048 ohm

A low on-resistance enhances power efficiency and helps minimize heat generation during operation, increasing overall system performance.

Terminal Position: SINGLE

A single terminal position contributes to straightforward designs, reducing complexity and enhancing ease of integration.

Technical Specifications

Power Field Effect Transistors (FET) STP185N10F3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

120 A

Maximum Drain Current (ID):

120 A

Maximum Drain-Source On Resistance:

.0048 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

480 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP185N10F3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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