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STI18NM60N

STMicroelectronics

STI18NM60N by STMicroelectronics

STI18NM60N by STMicroelectronics is an N-channel MOSFET ideal for switching applications, featuring a 600V breakdown voltage and 13A max drain current. It offers a compact through-hole design with built-in diode and operates at up to 150 °C. With a power dissipation of 110W, it's perfect for high-efficiency circuits.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 5,348 parts In-Stock

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5,348

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Digiode

USA . 3,571 parts In-Stock

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3,571

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Anansix

USA . 1,395 parts In-Stock

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1,395

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,133 parts In-Stock

1+ parts

$1.253

100+ parts

-

1k+ parts

$1.128

10k+ parts

-

1,133

$1.253

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$1.128

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MKK Technologies

India . 1,641 parts In-Stock

1+ parts

$2.356

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1,641

$2.356

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DigiPath Technology Company

USA . 1,641 parts In-Stock

1+ parts

$2.356

100+ parts

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1,641

$2.356

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AZTECH Wire

Italy . 750 parts In-Stock

1+ parts

$16.810

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750

$16.810

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A-Z Elektronik GmbH

Germany . 6,425 parts In-Stock

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6,425

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Alle Elektronik GmbH

Germany . 4,601 parts In-Stock

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4,601

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Parana Technologies

USA . 1,611 parts In-Stock

1+ parts

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$1.498

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1,611

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$1.498

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Corphita

USA . 166 parts In-Stock

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166

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Overview

Unlock the potential of your projects with the STI18NM60N from STMicroelectronics, a leader in high-quality semiconductor solutions. This robust N-channel power FET ensures efficient switching and reliability in diverse applications, from industrial machinery to renewable energy systems. With enhanced performance and superior thermal management, this device delivers exceptional value, helping you achieve optimal efficiency and longevity in your designs. Choose STI18NM60N for unmatched quality and innovation!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy as a package material provides durability and resistance to environmental factors, making this product suitable for a wide range of applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have better performance in terms of switching speed and efficiency, making this FET a good choice for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for easy integration into circuits and ensures protection against back EMF, enhancing reliability in switching applications.

Transistor Application: SWITCHING

Ideal for switching applications, this transistor can efficiently control power in various electronic devices, making it versatile in use.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage of 600 V means this FET can handle significant voltage levels, making it suitable for high-voltage applications.

Package Shape: RECTANGULAR

The rectangular shape allows for efficient use of space and facilitates easy mounting on PCBs, optimizing design layouts.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide secure connections and are particularly beneficial in robust applications requiring stability.

Operating Mode: ENHANCEMENT MODE

As an enhancement mode FET, this transistor offers lower power consumption during operation, making it an energy-efficient choice.

Maximum Pulsed Drain Current (IDM): 52 A

The capability to handle a maximum pulsed drain current of 52 A allows this FET to manage high-power loads effectively, enhancing performance in demanding applications.

Avalanche Energy Rating (EAS): 350 mJ

A high avalanche energy rating indicates robustness against transients, ensuring reliability under unexpected conditions.

Maximum Drain Current (Abs) (ID): 13 A

With a maximum absolute drain current of 13 A, this FET can support moderate power requirements, making it suitable for diverse circuit designs.

No. of Terminals: 3

Having three terminals simplifies the circuit design and allows for easier integration into various electronic projects.

Maximum Power Dissipation (Abs): 110 W

This high power dissipation capability (110 W) means the device can manage significant power without overheating, increasing its reliability during operation.

Package Style (Meter): IN-LINE

The in-line package style allows for efficient assembly and easier connection in circuit designs, optimizing the manufacturing process.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

This technology offers excellent voltage control and lower on-resistance, leading to enhanced overall performance and efficiency.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can perform in high-temperature environments, making it suitable for industrial applications.

Transistor Element Material: SILICON

Silicon as the element material provides good electrical properties, ensuring fast switching and reliable operation in electronic circuits.

Terminal Finish: MATTE TIN

A matte tin finish leads to good solderability and corrosion resistance, improving the durability and lifespan of the connections.

Maximum Drain Current (ID): 13 A

The maximum drain current rating of 13 A allows for versatile applications ranging from power management to signal amplification.

Maximum Drain-Source On Resistance: 0.285 ohm

With a low on-resistance, this FET minimizes power loss during operation, enhancing efficiency and reducing heat generation in circuits.

Terminal Position: SINGLE

A single terminal position simplifies the PCB layout and allows for straightforward integration into various circuit designs.

Technical Specifications

Power Field Effect Transistors (FET) STI18NM60N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

350 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

13 A

Maximum Drain Current (ID):

13 A

Maximum Drain-Source On Resistance:

.285 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

52 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STI18NM60N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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