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STI120NH03L

STMicroelectronics

STI120NH03L by STMicroelectronics

STI120NH03L by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 60 A, a breakdown voltage of 30 V, and operates at up to 175 °C. Ideal for high-power circuits with low on-resistance (0.0105 Ω).

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,879 parts In-Stock

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3,879

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Digiode

USA . 2,854 parts In-Stock

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2,854

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Anansix

USA . 2,188 parts In-Stock

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2,188

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,433 parts In-Stock

1+ parts

$1.244

100+ parts

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$1.119

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1,433

$1.244

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$1.119

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MKK Technologies

India . 589 parts In-Stock

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$2.339

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589

$2.339

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DigiPath Technology Company

USA . 589 parts In-Stock

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$2.339

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589

$2.339

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Parana Technologies

USA . 1,519 parts In-Stock

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$1.487

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1,519

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$1.487

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Corphita

USA . 1,428 parts In-Stock

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Overview

Unlock the potential of your electronic designs with the STI120NH03L from STMicroelectronics—a leader in innovation and reliability. This advanced N-channel Power FET is engineered for superior switching performance, making it ideal for high-efficiency applications. With robust construction and a built-in diode, it ensures exceptional durability under demanding conditions. Experience reduced power loss, enhanced thermal management, and seamless integration into your projects, delivering unmatched value and performance.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body enhances durability and resistance to environmental factors, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient than P-channel FETs, as they have lower on-resistance and higher conductance, making them ideal for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for easy integration into circuits requiring back EMF protection, simplifying design and improving reliability.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently control the flow of current, making it perfect for power management in various electronic devices.

Minimum DS Breakdown Voltage: 30 V

The minimum breakdown voltage of 30V ensures that this FET can operate reliably under a variety of conditions without risk of failure.

Package Shape: RECTANGULAR

The rectangular shape optimizes space utilization on the PCB and allows for easier handling and mounting during assembly.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide strong mechanical connections and are easier to solder, making this FET suitable for both prototyping and production.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption in off states, increasing overall energy efficiency in circuits.

Maximum Pulsed Drain Current (IDM): 240 A

A maximum pulsed drain current of 240A allows the FET to handle brief spikes in current, making it versatile for surge applications.

Avalanche Energy Rating (EAS): 700 mJ

The high avalanche energy rating means this FET can withstand voltage spikes without damage, enhancing reliability and longevity in demanding applications.

Maximum Drain Current (Abs) (ID): 60 A

A maximum drain current capacity of 60A enables this FET to support high-load applications, making it suitable for a wide range of power electronics.

No. of Terminals: 3

Having three terminals simplifies the circuit design while maintaining effective functionalities in switching and control applications.

Maximum Power Dissipation (Abs): 110 W

A maximum power dissipation of 110W allows this FET to manage high power levels without overheating, ensuring stable operation in demanding environments.

Package Style (Meter): IN-LINE

The in-line package style allows for compact designs and efficient PCB layout, optimizing space and enhancing circuit density.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high switching speeds and low on-resistance, making it ideal for modern power management applications requiring efficiency and performance.

Maximum Operating Temperature: 175 °C

Operating at a maximum temperature of 175 °C provides high thermal tolerance, allowing this FET to perform well under extreme conditions.

Transistor Element Material: SILICON

Silicon as the base material ensures robust electrical performance and good thermal stability, common in reliable and high-performance FETs.

Maximum Drain Current (ID): 60 A

Identical to the maximum drain current (Abs), this ensures design consistency; able to support up to 60A continuously without risking breakdown.

Maximum Drain-Source On Resistance: 0.0105 ohm

Low on-resistance minimizes power loss during operation, thereby enhancing overall efficiency and allowing for cooler operation of connected devices.

Terminal Position: SINGLE

Single terminal position streamlines circuit design and reduces complexity in both the layout and schematic diagrams.

Case Connection: DRAIN

Direct case connection to drain facilitates better heat dissipation and increases the effectiveness of thermal management strategies in high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) STI120NH03L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOW THRESHOLD

Avalanche Energy Rating (EAS):

700 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.0105 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

240 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STI120NH03L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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