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STB12NM50N

STMicroelectronics

STB12NM50N by STMicroelectronics

STB12NM50N by STMicroelectronics is a powerful N-channel FET designed for efficient switching applications. It features a 500V breakdown voltage, 11A max drain current, and operates at up to 150 °C. Ideal for high-performance power management in compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 8,808 parts In-Stock

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8,808

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Digiode

USA . 4,326 parts In-Stock

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4,326

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Bristol Electronics

USA . 902 parts In-Stock

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902

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Anansix

USA . 616 parts In-Stock

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616

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Atlantic Semiconductor

USA . 154 parts In-Stock

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154

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Rebound Electronics

UK . 100 parts In-Stock

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100

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IDEA Electronic Components Group

UK . 546 parts In-Stock

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$0.346

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$0.311

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546

$0.346

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$0.311

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MKK Technologies

India . 648 parts In-Stock

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$0.650

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648

$0.650

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DigiPath Technology Company

USA . 648 parts In-Stock

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$0.650

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648

$0.650

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Component Stockers USA

USA . 3,587 parts In-Stock

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$1.230

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$1.170

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$1.130

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$1.130

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AZTECH Wire

Italy . 1,020 parts In-Stock

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$15.460

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Kepictronics

USA . 13,000 parts In-Stock

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Perfect Parts

USA . 7,562 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,118 parts In-Stock

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Corphita

USA . 3,970 parts In-Stock

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Parana Technologies

USA . 2,236 parts In-Stock

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$0.414

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$0.414

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Overview

Unlock superior performance with the STB12NM50N from STMicroelectronics, a top-tier N-channel power FET designed for seamless switching applications. Renowned for its quality and reliability, STMicroelectronics delivers a device that excels in demanding environments, boasting impressive durability and efficiency. Ideal for automotive, industrial, and consumer electronics, this transistor ensures maximum power handling and reduced energy loss, providing exceptional value and peace of mind for your projects. Elevate your designs with trusted technology!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material provides excellent durability and reliability, making the FET ideal for various applications.

Polarity or Channel Type: N-CHANNEL

The N-channel configuration allows for a lower on-resistance and higher efficiency, making it suitable for power management applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for better protection against reverse currents, enhancing the reliability of the device in switching applications.

Transistor Application: SWITCHING

Designed for switching applications, this FET is perfect for power conversion and control circuits.

Surface Mount: YES

Surface mount technology enables compact designs and ease of automated assembly, making it suitable for modern electronic devices.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage ensures that the FET can operate safely in high-voltage applications without risk of failure.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space on PCBs, allowing for efficient layout in compact electronic designs.

Terminal Form: GULL WING

Gull wing terminals provide excellent soldering characteristics and mechanical strength, making them reliable for various mounting areas.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for high performance and efficiency in applications requiring controlled switching.

Maximum Pulsed Drain Current (IDM): 44 A

With a high pulsed drain current capability, this FET can handle transient conditions, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 350 mJ

A robust avalanche energy rating confirms the device's ability to withstand energy spikes, enhancing its robustness in real-world conditions.

Maximum Drain Current (Abs) (ID): 11 A

An absolute maximum drain current rating of 11 A makes this FET suitable for various power applications, supporting efficient power delivery.

No. of Terminals: 2

A simple 2-terminal design allows for straightforward integration into circuits, making it user-friendly for engineers.

Maximum Power Dissipation (Abs): 100 W

A high power dissipation capability ensures reliability and longevity even under demanding loads, making it a strong choice for high-performance applications.

Package Style (Meter): SMALL OUTLINE

The small outline package style aids in minimizing board space while allowing for easy handling and placement during assembly.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high-speed switching and low power consumption, ideal for efficient operation in electronic devices.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can function effectively in high-temperature environments without compromising performance.

Transistor Element Material: SILICON

Silicon as a base material ensures reliable performance and cost-effectiveness, making it the industry standard for FETs.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish enhances solderability and corrosion resistance, ensuring reliability over time in various environments.

Maximum Drain Current (ID): 11 A

The high maximum drain current rating allows it to handle robust loads, making this FET ideal for power applications.

Maximum Drain-Source On Resistance: 0.38 ohm

A low on-resistance value leads to reduced power loss and improved efficiency in switching applications, enhancing overall device performance.

Terminal Position: SINGLE

A single terminal position simplifies layout and connection design, minimizing complication in circuit configurations.

Maximum Time At Peak Reflow Temperature: 30 s

The ability to withstand peak reflow temperatures for 30 seconds ensures compatibility with standard soldering processes in manufacturing.

Peak Reflow Temperature: 245 C

A peak reflow temperature of 245 °C makes it compatible with most surface mount assembly processes, ensuring reliability in production.

Technical Specifications

Power Field Effect Transistors (FET) STB12NM50N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

350 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

11 A

Maximum Drain Current (ID):

11 A

Maximum Drain-Source On Resistance:

.38 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

44 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB12NM50N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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