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NTDV3055L104-1G

Onsemi

NTDV3055L104-1G by Onsemi

NTDV3055L104-1G by Onsemi is a Power FET with 60V DS Breakdown Voltage, 45A IDM, and 0.104 ohm RDS(on). Ideal for SWITCHING applications, it features an ENHANCEMENT MODE and a built-in DIODE. Operating at up to 175 °C, this N-CHANNEL transistor has a max power dissipation of 48W in a RECTANGULAR package.

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Vyrian

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Digiode

USA . 2,111 parts In-Stock

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AZTECH Wire

Italy . 106 parts In-Stock

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Kepictronics

USA . 13,000 parts In-Stock

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SupplyDigital Components

Austria . 7,063 parts In-Stock

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Problanco Electronics

Mexico . 5,555 parts In-Stock

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Kulean Microsystems

USA . 4,592 parts In-Stock

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TANS Electronics

Latvia . 3,249 parts In-Stock

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Corphita

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Perfect Parts

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UHIMA Technologies

Türkiye . 559 parts In-Stock

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Corohmni

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Overview

Unlock the power of efficient switching with the Onsemi NTDV3055L104-1G Power Field Effect Transistor. Manufactured by industry leader Onsemi, this N-channel FET offers superior quality and reliability. Ideal for various applications, this transistor features a single configuration with a built-in diode, making it perfect for enhancement mode switching. With a minimum DS breakdown voltage of 60V and maximum pulsed drain current of 45A, this transistor delivers exceptional performance. Experience the value and benefits of this high-quality component for your projects today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection for the internal components of the FET.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower resistance and higher current capabilities compared to P-channel FETs, making them suitable for high power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for efficient reverse current protection in the circuit.

Transistor Application: SWITCHING

Designed specifically for switching applications, offering fast switching speeds and low power dissipation.

Minimum DS Breakdown Voltage: 60 V

With a minimum breakdown voltage of 60V, this FET can handle higher voltages in the circuit without failure.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide a secure and reliable connection to the circuit board.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs only conduct when a voltage is applied to the gate, allowing for precise control of the circuit.

Maximum Pulsed Drain Current (IDM): 45 A

High pulsed drain current capability allows for handling sudden surge currents in the circuit.

Avalanche Energy Rating (EAS): 61 mJ

The high avalanche energy rating ensures that the FET can withstand short-duration high energy spikes.

Maximum Drain Current (Abs) (ID): 12 A

The maximum drain current rating of 12A indicates the FET's ability to handle high current loads without damage.

Maximum Power Dissipation (Abs): 48 W

With a maximum power dissipation of 48W, this FET can handle high power levels without overheating.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers low on-state resistance and high switching speeds, making it suitable for power applications.

Maximum Operating Temperature: 175 °C

With a maximum operating temperature of 175 °C, this FET can operate reliably in high-temperature environments.

Transistor Element Material: SILICON

Silicon is a commonly used semiconductor material known for its reliability and efficiency in electronic components.

Terminal Finish: Tin (Sn)

Tin terminal finish provides good solderability and corrosion resistance, ensuring a reliable connection in the circuit.

Maximum Drain-Source On Resistance: 0.104 ohm

Low drain-source on resistance (0.104 ohm) results in minimal power loss and efficient conduction in the FET.

Terminal Position: SINGLE

Single terminal position simplifies the circuit connection process and reduces the chances of errors during installation.

Case Connection: DRAIN

Drain connection offers a convenient point for connecting the FET to the circuit, allowing for easy integration into the overall design.

Technical Specifications

Power Field Effect Transistors (FET) NTDV3055L104-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

61 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.104 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

45 A

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Tin (Sn)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTDV3055L104-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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