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FDD5670

Onsemi

FDD5670 by Onsemi

FDD5670 by Onsemi is a N-CHANNEL Power FET with 60V DS Breakdown Voltage, ideal for SWITCHING applications. It features a max IDM of 150A and EAS of 360mJ, with 0.015 ohm RDS(ON). The transistor operates in ENHANCEMENT MODE and has a max power dissipation of 70W at 175°C.

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5

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1k+

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Chip Stock

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Digiode

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Bristol Electronics

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Native Components

USA . 887 parts In-Stock

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$0.544

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Northwest PG Solutions

USA . 1,760 parts In-Stock

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$0.598

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Metaverse IC Inc.

Canada . 90,000 parts In-Stock

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RC Electronics

USA . 41,674 parts In-Stock

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Kepictronics

USA . 27,860 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

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Perfect Parts

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Problanco Electronics

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TANS Electronics

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Overview

Experience unparalleled performance and reliability with the Onsemi FDD5670 Power Field Effect Transistor. Crafted by a trusted manufacturer, this N-CHANNEL transistor offers exceptional quality for your switching applications. With a maximum power dissipation of 70W and a minimum DS breakdown voltage of 60V, this FET ensures efficient operation and durability. Whether you're in need of high-speed switching or power management solutions, the FDD5670 delivers outstanding value and benefits to meet your requirements. Upgrade your designs with this versatile and dependable component today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides good insulation and thermal properties, making the transistor more durable and reliable.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have better performance and efficiency compared to P-channel FETs, making them ideal for various applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps prevent reverse current flow, enhancing the efficiency and reliability of the transistor in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching operations, ensuring fast and efficient performance in applications where quick on/off switching is required.

Surface Mount: YES

Surface mount technology allows for easy and efficient PCB assembly, saving space and reducing overall assembly costs.

Minimum DS Breakdown Voltage: 60 V

With a high breakdown voltage, this FET can handle higher voltage requirements, making it suitable for a wide range of applications.

Package Shape: RECTANGULAR

Rectangular packages are commonly used and easy to handle, making the transistor suitable for various mounting configurations.

Terminal Form: GULL WING

The gull wing terminal form provides strong mechanical stability and easy soldering during assembly, ensuring a reliable connection.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are easy to use and control, making them suitable for a wide range of applications that require precise switching.

Maximum Pulsed Drain Current (IDM): 150 A

The high pulsed drain current rating allows the transistor to handle surges in current, enhancing its reliability in demanding conditions.

Avalanche Energy Rating (EAS): 360 mJ

The high avalanche energy rating indicates the FET's ability to handle energy spikes, making it suitable for rugged applications.

Maximum Drain Current (Abs) (ID): 48 A

With a high drain current rating, this FET can handle high current loads without overheating, ensuring reliable performance.

No. of Terminals: 2

Having only two terminals simplifies the circuit design and connection process, making the transistor easy to integrate into various systems.

Maximum Power Dissipation (Abs): 70 W

The high power dissipation rating allows the FET to handle high power levels, ensuring stable operation in demanding environments.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the PCB, making it ideal for compact electronic devices or densely populated boards.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high performance and reliability, making the FET suitable for a wide range of applications.

Maximum Operating Temperature: 175 °C

With a high operating temperature range, this transistor can withstand extreme heat conditions, making it suitable for industrial applications.

Transistor Element Material: SILICON

Silicon is a common and reliable semiconductor material, providing good electrical properties and ensuring stable performance of the transistor.

Terminal Finish: MATTE TIN

Matte tin finish offers good solderability and corrosion resistance, ensuring a durable and reliable connection in various operating conditions.

Maximum Drain Current (ID): 21 A

The high drain current rating allows the FET to handle high current loads, making it suitable for high-power applications.

Maximum Drain-Source On Resistance: 0.015 ohm

Low drain-source on resistance results in minimal power loss and heat generation, improving the efficiency and performance of the transistor.

Terminal Position: SINGLE

Having a single terminal position simplifies the installation process and reduces the risk of wiring errors, ensuring easy integration into circuits.

Case Connection: DRAIN

The drain connection simplifies the circuit design and ensures efficient current flow, enhancing the overall performance of the transistor.

Maximum Time At Peak Reflow Temperature (s): 30

The short reflow time at peak temperature simplifies the assembly process, saving time and ensuring reliable solder joints.

Peak Reflow Temperature °C: 260

With a high peak reflow temperature, this FET can withstand high-temperature soldering processes, ensuring a strong and reliable solder connection.

Technical Specifications

Power Field Effect Transistors (FET) FDD5670 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

360 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

48 A

Maximum Drain Current (ID):

21 A

Maximum Drain-Source On Resistance:

.015 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

150 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FDD5670 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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