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FDB14N30

Onsemi

FDB14N30 by Onsemi

FDB14N30 by Onsemi is a N-CHANNEL Power FET with 300V DS Breakdown Voltage, ideal for SWITCHING applications. It features a max IDM of 56A and 0.29 ohm RDS(ON), operating in ENHANCEMENT MODE at up to 150 °C. The PLASTIC/EPOXY package with GULL WING terminals makes it suitable for surface mount designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 2,448 parts In-Stock

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Digiode

USA . 1,253 parts In-Stock

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Native Components

USA . 899 parts In-Stock

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$0.630

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899

$0.630

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Northwest PG Solutions

USA . 2,020 parts In-Stock

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$0.693

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Problanco Electronics

Mexico . 8,072 parts In-Stock

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Kulean Microsystems

USA . 6,736 parts In-Stock

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Authorized Procurement Solutions

USA . 6,000 parts In-Stock

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SupplyDigital Components

Austria . 5,714 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,250 parts In-Stock

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Corphita

USA . 1,677 parts In-Stock

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UHIMA Technologies

Türkiye . 680 parts In-Stock

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Corohmni

South Africa . 400 parts In-Stock

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400

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TANS Electronics

Latvia . 393 parts In-Stock

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Supply Digital

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Overview

Unleash the power of cutting-edge technology with the FDB14N30 by Onsemi. This high-quality Power Field Effect Transistor (FET) offers unparalleled performance in switching applications, thanks to its N-CHANNEL design and SINGLE configuration with a built-in diode. Ideal for a wide range of uses, from industrial automation to consumer electronics, this transistor provides exceptional value with its impressive 300V minimum DS breakdown voltage and 56A maximum pulsed drain current. Trust Onsemi's expertise in semiconductor manufacturing and elevate your projects with the FDB14N30.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material makes the package lightweight and durable, ideal for applications where weight and strength are important factors.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-resistance and better performance characteristics compared to P-channel FETs, making them a popular choice for many applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and provides protection against reverse voltage polarity, making this FET more versatile and user-friendly.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast response times and low power dissipation, making it efficient for controlling power in electronic circuits.

Surface Mount: YES

Surface mount technology allows for easy and efficient PCB assembly, saving space and reducing overall system size.

Minimum DS Breakdown Voltage: 300 V

With a high breakdown voltage, this FET can handle higher voltages and is suitable for applications requiring robust and reliable performance.

Avalanche Energy Rating (EAS): 330 mJ

The high avalanche energy rating indicates that this FET can withstand high energy spikes and transient events, improving system reliability and durability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers low gate capacitance and fast switching speeds, making this FET efficient for high-frequency applications with low power loss.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can operate reliably in harsh environments with elevated temperatures, ensuring long-term performance and durability.

Maximum Drain-Source On Resistance: 0.29 ohm

The low on-resistance of this FET results in reduced power loss and improved efficiency, making it suitable for high-current applications with minimal voltage drop.

Technical Specifications

Power Field Effect Transistors (FET) FDB14N30 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

330 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

300 V

Maximum Drain Current (ID):

14 A

Maximum Drain-Source On Resistance:

.29 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263

JESD-30 Code:

R-PSSO-G2

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

56 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FDB14N30 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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