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FDB150N10

Onsemi

FDB150N10 by Onsemi

FDB150N10 by Onsemi is a N-CHANNEL Power FET with 100V DS Breakdown Voltage and 57A Drain Current. Ideal for SWITCHING applications, it features a built-in DIODE, 228A Pulsed Drain Current, and 0.015 ohm On Resistance. Suitable for surface mount with PLASTIC/EPOXY body material and GULL WING terminals.

Median Price

$2.810

Lifecycle Status

Suppliers In-Stock

8

In-Stock Inventory

1k+

Distributors (Authorized)

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Mouser Electronics

USA . 633 parts In-Stock

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$2.810

100+ parts

$2.290

1k+ parts

$1.780

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633

$2.810

$2.290

$1.780

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DigiKey

USA . 284 parts In-Stock

1+ parts

$3.340

100+ parts

$2.318

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$1.816

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$1.787

284

$3.340

$2.318

$1.816

$1.787

Verical

USA . 4,800 parts In-Stock

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$1.798

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4,800

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$1.798

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Distributors (In-Stock)

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Digiode

USA . 1,882 parts In-Stock

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$1.890

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Vyrian

USA . 1,166 parts In-Stock

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$1.990

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Flip Electronics

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4,800

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Chip Stock

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Bristol Electronics

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Component Stockers USA

USA . 3,925 parts In-Stock

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$1.200

100+ parts

$1.150

1k+ parts

$1.110

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3,925

$1.200

$1.150

$1.110

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Corphita

USA . 2,723 parts In-Stock

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$1.791

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Corohmni

South Africa . 50 parts In-Stock

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$1.990

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Microchip USA

USA . 9,243 parts In-Stock

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$16.348

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Metaverse IC Inc.

Canada . 50,000 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

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TANS Electronics

Latvia . 7,843 parts In-Stock

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Authorized Procurement Solutions

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Perfect Parts

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Kulean Microsystems

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Problanco Electronics

Mexico . 3,626 parts In-Stock

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Supply Digital

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Northwest PG Solutions

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Kepictronics

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SupplyDigital Components

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UHIMA Technologies

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Native Components

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Overview

Experience the superior performance and reliability of the FDB150N10 by Onsemi, a leading manufacturer known for its top-quality power field effect transistors. This N-channel transistor with a built-in diode is perfect for switching applications, offering customers exceptional value and benefits. With a maximum drain current of 57A and a low on-resistance of 0.015 ohm, this transistor delivers efficient operation and high power dissipation. Whether you're looking to enhance your electronic devices or optimize your systems, the FDB150N10 is the ideal choice for all your power needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the transistor, making it suitable for various environments.

Polarity or Channel Type: N-CHANNEL

N-channel transistors generally have higher electron mobility and faster switching speeds compared to P-channel transistors, enhancing performance.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for protection against reverse voltage and efficient switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring reliable performance in such scenarios.

Surface Mount: YES

Easy to mount on circuit boards, making installation and integration streamlined.

Minimum DS Breakdown Voltage: 100 V

Can handle high voltages, ensuring robustness and reliability in power applications.

Terminal Form: GULL WING

Provides secure connections and facilitates easy soldering onto circuit boards.

Operating Mode: ENHANCEMENT MODE

Enhancement mode transistors are typically easier to use and control, offering simplicity in circuit design.

Maximum Pulsed Drain Current (IDM): 228 A

Capable of handling high peak currents, suitable for heavy-duty applications.

Avalanche Energy Rating (EAS): 132 mJ

Ability to withstand energy spikes and transient events, enhancing reliability in harsh conditions.

Maximum Drain Current (Abs) (ID): 57 A

High drain current capability ensures efficient operation in power circuits.

Maximum Power Dissipation (Abs): 110 W

Can dissipate significant amounts of power without overheating, ensuring stable performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Common and proven technology known for reliability and efficiency in power applications.

Maximum Operating Temperature: 150 °C

Can operate at high temperatures, suitable for a wide range of environments and applications.

Transistor Element Material: SILICON

Silicon transistors offer high performance and reliability, making them a popular choice in power electronics.

Terminal Finish: Matte Tin (Sn) - annealed

Provides a reliable and durable finish for the terminals, ensuring long-term functionality.

Maximum Drain-Source On Resistance: 0.015 ohm

Low on-resistance leads to minimal power loss and efficient operation in power circuits.

Terminal Position: SINGLE

Simplified terminal configuration for easy installation and connection in circuit designs.

Case Connection: DRAIN

Specific case connection for efficient heat dissipation and improved reliability.

Maximum Time At Peak Reflow Temperature (s): 30

Can withstand high reflow temperatures for a sufficient duration during manufacturing processes.

Peak Reflow Temperature °C: 245

Capable of withstanding high reflow temperatures, suitable for modern assembly techniques.

Technical Specifications

Power Field Effect Transistors (FET) FDB150N10 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

132 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

57 A

Maximum Drain Current (ID):

57 A

Maximum Drain-Source On Resistance:

.015 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

228 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FDB150N10 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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