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FCH47N60NF

Onsemi

FCH47N60NF by Onsemi

FCH47N60NF by Onsemi is a N-CHANNEL Power FET with 600V DS Breakdown Voltage. Ideal for SWITCHING applications, it features a Max IDM of 137.4A and EAS of 2926mJ. Operating in ENHANCEMENT MODE, it has a Drain Current (ID) of 45.8A and 0.065 ohm RDS(on).

Median Price

$7.006

Lifecycle Status

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NAC Semi

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Native Components

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Northwest PG Solutions

USA . 1,148 parts In-Stock

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Corohmni

South Africa . 202 parts In-Stock

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Microchip USA

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Overview

Experience the power of innovation with the FCH47N60NF Power FET from Onsemi. Designed with cutting-edge technology and high-quality materials, this N-CHANNEL transistor offers exceptional performance in switching applications. With a robust construction and built-in diode, this transistor provides reliable operation and efficient energy management. Whether you're in the industrial, automotive, or consumer electronics sector, this transistor is versatile and adaptable to a wide range of applications. Trust Onsemi to deliver superior quality and value with the FCH47N60NF Power FET.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic/epoxy material offers good protection and durability for the FET, making it reliable for long-term use.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are commonly used in high-power applications due to their lower resistance and higher efficiency.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode helps in protecting the circuit against reverse polarity, enhancing the overall reliability of the FET.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient and fast switching operations.

Minimum DS Breakdown Voltage: 600 V

High breakdown voltage allows the FET to handle high voltages, making it suitable for various high-power applications.

Terminal Form: THROUGH-HOLE

Through-hole terminals offer secure connections and ease of soldering during assembly.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are easy to control and operate, providing better performance in switching applications.

Maximum Pulsed Drain Current (IDM): 137.4 A

High pulsed drain current rating allows the FET to handle sudden surges in current without failure.

Avalanche Energy Rating (EAS): 2926 mJ

High avalanche energy rating indicates the FET's ability to withstand high energy spikes, ensuring reliable operation.

Maximum Power Dissipation (Abs): 368 W

High power dissipation capability enables the FET to handle high power loads without overheating.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can be used in a wide range of temperature environments without performance degradation.

Maximum Drain-Source On Resistance: 0.065 ohm

Low drain-source on resistance minimizes power loss and improves efficiency in high-current applications.

Technical Specifications

Power Field Effect Transistors (FET) FCH47N60NF attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

2926 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

45.8 A

Maximum Drain Current (ID):

45.8 A

Maximum Drain-Source On Resistance:

.065 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

137.4 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FCH47N60NF Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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