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FCH029N65S3-F155

Onsemi

FCH029N65S3-F155 by Onsemi

FCH029N65S3-F155 by Onsemi is a N-CHANNEL Power FET with 650V DS Breakdown Voltage and 200A IDM. Ideal for SWITCHING applications, it has a max power dissipation of 463W and operates in ENHANCEMENT MODE at temperatures ranging from -55 to 150 °C.

Median Price

$20.540

Lifecycle Status

Suppliers In-Stock

12

In-Stock Inventory

1k+

Distributors (Authorized)

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Arrow

USA . 214 parts In-Stock

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$3.594

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$3.594

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Farnell

UK . 118 parts In-Stock

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$13.360

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$7.630

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$13.360

$7.630

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Mouser Electronics

USA . 251 parts In-Stock

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$20.520

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$20.520

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DigiKey

USA . 391 parts In-Stock

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$20.560

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$12.947

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$11.701

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391

$20.560

$12.947

$11.701

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Element14

Singapore . 118 parts In-Stock

1+ parts

$24.510

100+ parts

$19.470

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$17.640

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118

$24.510

$19.470

$17.640

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Newark

USA . 118 parts In-Stock

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$25.620

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$17.150

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$16.810

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118

$25.620

$17.150

$16.810

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Chip1Stop

Japan . 275 parts In-Stock

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$63.500

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$28.200

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$63.500

$28.200

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Rochester

USA . 4,196 parts In-Stock

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$11.690

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$10.460

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$9.850

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$11.690

$10.460

$9.850

Verical

USA . 214 parts In-Stock

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Digiode

USA . 2,473 parts In-Stock

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$5.132

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$5.132

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Vyrian

USA . 8,453 parts In-Stock

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Flip Electronics

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Corphita

USA . 1,679 parts In-Stock

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$4.862

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1,679

$4.862

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Corohmni

South Africa . 278 parts In-Stock

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$5.182

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278

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Continental Prestige Electronics

USA . 155 parts In-Stock

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$13.910

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$10.800

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155

$13.910

$10.800

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Microchip USA

USA . 6,495 parts In-Stock

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$47.932

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$47.932

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Problanco Electronics

Mexico . 7,964 parts In-Stock

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TANS Electronics

Latvia . 6,849 parts In-Stock

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SupplyDigital Components

Austria . 4,490 parts In-Stock

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Kulean Microsystems

USA . 3,018 parts In-Stock

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Perfect Parts

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Northwest PG Solutions

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Native Components

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Authorized Procurement Solutions

USA . 285 parts In-Stock

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UHIMA Technologies

Türkiye . 124 parts In-Stock

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Overview

Looking for a reliable and high-quality power Field Effect Transistor (FET) for your switching applications? Look no further than the FCH029N65S3-F155 by Onsemi. With a minimum DS breakdown voltage of 650V and a maximum pulsing drain current of 200A, this N-channel transistor offers exceptional performance and reliability. Its single configuration with a built-in diode makes it ideal for a wide range of applications. Trust Onsemi's expertise in semiconductor technology to deliver a product that exceeds your expectations. Upgrade your electronic devices with the FCH029N65S3-F155 and experience improved efficiency and performance like never before.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material provides durability and protection for the Power FET, making it a reliable choice for various applications.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs generally have lower ON resistance and higher current handling capabilities compared to P-Channel FETs, making them suitable for high-power applications.

Transistor Application: SWITCHING

Being specifically designed for switching applications, this Power FET can efficiently control the flow of current in electronic circuits.

Minimum DS Breakdown Voltage: 650 V

The high breakdown voltage of 650 V ensures safe operation in high voltage applications, making this Power FET suitable for power supplies and motor control.

Maximum Pulsed Drain Current (IDM): 200 A

With a high pulsed drain current rating of 200 A, this Power FET can handle short-duration high current spikes without damage, making it suitable for power switching applications.

Maximum Power Dissipation (Abs): 463 W

The high power dissipation capability of 463 W allows this Power FET to handle high power levels without overheating, making it suitable for high-power applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this Power FET can operate reliably in high-temperature environments, ensuring consistent performance in challenging conditions.

Technical Specifications

Power Field Effect Transistors (FET) FCH029N65S3-F155 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

503 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

650 V

Maximum Drain Current (ID):

75 A

Maximum Drain-Source On Resistance:

.029 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

200 A

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FCH029N65S3-F155 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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