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BLF2043,112

NXP Semiconductors

BLF2043,112 by NXP Semiconductors

BLF2043,112 by NXP Semiconductors is a single N-channel MOSFET designed for high-performance applications. It supports a max drain current of 2.2 A and operates up to 200 °C, making it ideal for power management in RF amplifiers and industrial systems.

Median Price

$1.164

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

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Nova Conductors

Japan . 100 parts In-Stock

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$1.164

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Vyrian

USA . 6,320 parts In-Stock

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Digiode

USA . 1,131 parts In-Stock

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Anansix

USA . 751 parts In-Stock

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Native Components

USA . 907 parts In-Stock

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$0.749

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$0.749

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Northwest PG Solutions

USA . 119 parts In-Stock

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$0.824

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One Stop Electronics

USA . 986 parts In-Stock

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$9.050

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986

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AZTECH Wire

Italy . 72 parts In-Stock

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$14.770

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Component Stockers USA

USA . 233 parts In-Stock

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$99.990

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Corphita

USA . 4,801 parts In-Stock

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UNI Independent Distributors

Spain . 2,031 parts In-Stock

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Overview

Unlock exceptional performance with the BLF2043,112 from NXP Semiconductors, a leader in innovative power solutions. This N-channel FET delivers reliability and efficiency, ideal for diverse applications like RF amplifiers and switching circuits. With its robust design and high tolerance to extreme temperatures, it ensures long-lasting operation. Experience the unmatched quality and support that comes from NXP, empowering your projects with superior performance and peace of mind.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their high electron mobility, which results in faster switching speeds and lower on-resistance, making this product ideal for high-performance applications.

Configuration: SINGLE

A single configuration simplifies circuit design and helps reduce overall circuit complexity, making it easier to implement in various applications.

Maximum Drain Current (Abs) (ID): 2.2 A

With a maximum drain current of 2.2 A, this FET can handle substantial loads, offering versatility for a wide range of power management applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enhances switching performance and allows for low power consumption, making this FET suitable for energy-efficient designs.

Maximum Operating Temperature: 200 °C

The ability to operate at a maximum temperature of 200 °C ensures reliability in harsh environments, making this FET ideal for high-temperature applications.

Maximum Drain Current (ID): 2.2 A

Reiterating the 2.2 A rating emphasizes the capability of the FET to support demanding power requirements while maintaining performance stability.

Technical Specifications

Power Field Effect Transistors (FET) BLF2043,112 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

2.2 A

Maximum Drain Current (ID):

2.2 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Maximum Operating Temperature:

200 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Trade Compliance

BLF2043,112 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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