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STW17N62K3

STMicroelectronics

STW17N62K3 by STMicroelectronics

STW17N62K3 from STMicroelectronics is an N-channel FET ideal for switching applications, featuring a 620V breakdown voltage and 15A max drain current. It offers a low on-resistance of 0.38Ω and operates at up to 150 °C. Its robust design ensures reliable performance in demanding environments.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

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Digiode

USA . 2,388 parts In-Stock

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Vyrian

USA . 2,233 parts In-Stock

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Anansix

USA . 1,218 parts In-Stock

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R&J Components

USA . 579 parts In-Stock

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579

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IDEA Electronic Components Group

UK . 39 parts In-Stock

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$0.422

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$0.380

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39

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$0.380

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MKK Technologies

India . 1,198 parts In-Stock

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$0.794

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DigiPath Technology Company

USA . 1,198 parts In-Stock

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$0.794

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$0.794

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AZTECH Wire

Italy . 1,025 parts In-Stock

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$21.240

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Alle Elektronik GmbH

Germany . 4,005 parts In-Stock

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A-Z Elektronik GmbH

Germany . 1,628 parts In-Stock

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Perfect Parts

USA . 1,085 parts In-Stock

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Corphita

USA . 1,035 parts In-Stock

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Parana Technologies

USA . 373 parts In-Stock

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$0.505

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Overview

Elevate your power management solutions with the STW17N62K3 from STMicroelectronics, a leader in innovation and quality. This N-channel power FET combines superior performance with reliability, making it ideal for demanding switching applications. With its robust design, it handles high voltages with ease and ensures efficient energy use, empowering your designs while reducing costs and enhancing longevity. Trust STMicroelectronics for unmatched value and expertise in every project!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy enhances durability and moisture resistance, making the product suitable for various operational environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer higher efficiency and faster switching speeds, making them ideal for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides protection against reverse voltage and enhances overall circuit reliability.

Transistor Application: SWITCHING

Optimized for switching applications, this FET ensures low power loss and high efficiency in electronic designs.

Minimum DS Breakdown Voltage: 620 V

A high breakdown voltage allows for safe operation in high-voltage applications, providing flexibility in circuit design.

Package Shape: RECTANGULAR

The rectangular shape is advantageous for easy assembly and integration into various circuit layouts.

Terminal Form: THROUGH-HOLE

Through-hole mounting provides strong mechanical support and reliability in high-vibration environments.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation ensures that the FET is off when no voltage is applied, providing better control over power consumption.

Maximum Pulsed Drain Current (IDM): 60 A

High pulsed current capability allows the FET to handle transient loads effectively, making it suitable for dynamic applications.

Avalanche Energy Rating (EAS): 315 mJ

A robust avalanche energy rating enhances reliability in harsh conditions, allowing for safe operation during unexpected voltage spikes.

Maximum Drain Current (Abs) (ID): 15 A

A maximum drain current of 15 A ensures ample current handling for various applications, promoting versatility in usage scenarios.

No. of Terminals: 3

The 3-terminal configuration simplifies circuit design, making it user-friendly and easy to integrate into existing systems.

Maximum Power Dissipation (Abs): 190 W

High power dissipation capabilities ensure reliable performance under heavy loads, thus enhancing the longevity of the component.

Package Style (Meter): FLANGE MOUNT

Flange mount style allows for secure attachment and heat dissipation, valuable in high-performance applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology allows for faster switching speeds and lower gate drive power, making it energy efficient.

Maximum Operating Temperature: 150 °C

A high operating temperature capability offers resilience in extreme conditions, reducing the likelihood of thermal failure.

Transistor Element Material: SILICON

Silicon provides effective thermal conductivity and optimal electrical performance, ensuring reliable operation.

Terminal Finish: MATTE TIN

Matte tin finish ensures excellent solderability and corrosion resistance, promoting long-term reliability in connections.

Maximum Drain Current (ID): 15 A

Reiterating adequate maximum drain current reinforces that this FET can cater to a wide array of power applications effectively.

Maximum Drain-Source On Resistance: 0.38 ohm

Low on-resistance minimizes power losses during operation, maximizing efficiency and performance in power circuits.

Terminal Position: SINGLE

Single terminal positioning simplifies design considerations, making it easier to integrate into various layouts.

Technical Specifications

Power Field Effect Transistors (FET) STW17N62K3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

AVALANCHE ENERGY RATED

Avalanche Energy Rating (EAS):

315 mJ

Minimum DS Breakdown Voltage:

620 V

Maximum Drain Current (Abs) (ID):

15 A

Maximum Drain Current (ID):

15 A

Maximum Drain-Source On Resistance:

.38 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

60 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW17N62K3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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