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STW13NK80Z

STMicroelectronics

STW13NK80Z by STMicroelectronics

STW13NK80Z by STMicroelectronics is an N-channel FET ideal for switching applications, featuring a max drain current of 12 A and a breakdown voltage of 800 V. It operates in enhancement mode with a power dissipation of up to 230 W. This versatile transistor is suitable for high-voltage circuits.

Median Price

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Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

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Vyrian

USA . 8,919 parts In-Stock

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Anansix

USA . 1,192 parts In-Stock

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Digiode

USA . 634 parts In-Stock

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Electronics Depot

USA . 45 parts In-Stock

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Cyclops Electronics Ltd

UK . 5 parts In-Stock

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5

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LittleDiode

UK . 1 parts In-Stock

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IDEA Electronic Components Group

UK . 586 parts In-Stock

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$1.041

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$0.936

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586

$1.041

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$0.936

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MKK Technologies

India . 1,813 parts In-Stock

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$1.957

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$1.957

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DigiPath Technology Company

USA . 1,813 parts In-Stock

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$1.957

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$1.957

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AZTECH Wire

Italy . 901 parts In-Stock

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$8.550

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901

$8.550

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Corphita

USA . 4,649 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,821 parts In-Stock

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Kepictronics

USA . 3,562 parts In-Stock

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Parana Technologies

USA . 1,486 parts In-Stock

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$1.244

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Overview

Unlock unparalleled efficiency with the STW13NK80Z from STMicroelectronics, a leader in semiconductor innovation. This N-channel power FET is designed for seamless switching applications, delivering exceptional quality and reliability. With high voltage capabilities and robust performance, it’s perfect for power management in industrial and consumer electronics. Elevate your designs and ensure long-lasting durability while benefiting from STMicroelectronics' commitment to excellence and cutting-edge technology.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material ensures durability and protects the internal components from environmental factors, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

As an N-channel FET, this transistor is ideal for high-speed switching applications, providing better performance in typical circuit designs.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances the safety and efficiency of the circuit, allowing for better management of back EMF and protecting the transistor from potential damage.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast response times, making it an excellent choice for power management and control systems.

Minimum DS Breakdown Voltage: 800 V

With a high breakdown voltage, this FET can handle high voltage applications, providing reliability and safety in demanding conditions.

Package Shape: RECTANGULAR

The rectangular package shape facilitates easy integration into various circuit layouts and enhances mounting options.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical support and ease of soldering, ensuring a secure connection to the circuit board.

Operating Mode: ENHANCEMENT MODE

The enhancement mode operation allows for better control and efficiency in the switching function, which optimizes overall performance.

Maximum Pulsed Drain Current (IDM): 48 A

A high pulsed drain current rating indicates the ability to handle short bursts of high current, making it suitable for applications like motor control and power inverters.

Avalanche Energy Rating (EAS): 450 mJ

The ability to withstand significant avalanche energy ensures reliability under stress conditions, making this FET resilient against transient voltage spikes.

Maximum Drain Current (Abs) (ID): 12 A

The maximum drain current rating supports a wide range of applications, especially in power circuits where moderate current handling is required.

No. of Terminals: 3

The three-terminal configuration simplifies the design and layout of circuits while providing all necessary connectivity for efficient operation.

Maximum Power Dissipation (Abs): 230 W

With a high power dissipation capability, this FET can efficiently manage power without overheating, making it suitable for intensive applications.

Package Style (Meter): FLANGE MOUNT

The flange mount package style enhances heat dissipation and stability while providing strong mechanical attachment to the heat sink or PCB.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology ensures low on-resistance and high-speed switching performance, significantly improving circuit efficiency and response times.

Maximum Operating Temperature: 150 °C

The ability to operate at elevated temperatures makes the FET suitable for high-performance applications that may encounter extreme thermal conditions.

Transistor Element Material: SILICON

Silicon as the base material is widely used due to its excellent semiconductor properties, providing reliable performance and efficiency.

Terminal Finish: MATTE TIN

The matte tin finish improves solderability and corrosion resistance, ensuring long-lasting performance in various environments.

Maximum Drain Current (ID): 12 A

This rating, repeated from earlier, underscores the suitability of this FET for various applications where moderate current is required for stable operation.

Maximum Drain-Source On Resistance: 0.65 ohm

0.65 ohm on-resistance indicates minimal power losses during operation, enhancing the overall efficiency of the circuits in which this FET is used.

Terminal Position: SINGLE

The single terminal position aids in simplified design layouts, promoting flexibility in circuit configurations.

Technical Specifications

Power Field Effect Transistors (FET) STW13NK80Z attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

450 mJ

Minimum DS Breakdown Voltage:

800 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.65 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

48 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW13NK80Z Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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