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STP60NE10FP

STMicroelectronics

STP60NE10FP by STMicroelectronics

STP60NE10FP from STMicroelectronics is a robust N-channel FET designed for efficient switching applications. It features a max drain current of 30 A, breakdown voltage of 100 V, and operates at up to 175 °C. Ideal for power management in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,293 parts In-Stock

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4,293

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Vyrian

USA . 3,972 parts In-Stock

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3,972

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Anansix

USA . 1,025 parts In-Stock

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1,025

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,468 parts In-Stock

1+ parts

$0.448

100+ parts

-

1k+ parts

$0.403

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1,468

$0.448

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$0.403

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MKK Technologies

India . 1,728 parts In-Stock

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$0.843

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1,728

$0.843

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DigiPath Technology Company

USA . 1,728 parts In-Stock

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$0.843

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1,728

$0.843

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Corphita

USA . 3,317 parts In-Stock

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3,317

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Parana Technologies

USA . 761 parts In-Stock

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$0.536

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761

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$0.536

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Kepictronics

USA . 345 parts In-Stock

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345

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Overview

Elevate your designs with the STP60NE10FP from STMicroelectronics—a powerhouse in the realm of N-channel Power FETs. Renowned for their unmatched quality and reliability, STMicroelectronics delivers exceptional performance that enhances switching applications across various industries. With a robust design that ensures efficient power management, this transistor promises durability and efficiency, making it an ideal choice for your next project. Embrace innovation and experience superior value today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The durable plastic/epoxy material ensures good resistance to heat and environmental factors, which enhances the reliability of the transistor in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are typically more efficient than P-channel transistors, providing better performance and lower on-resistance.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies design and reduces board space, allowing for easier integration into circuits while providing reverse polarity protection.

Transistor Application: SWITCHING

Designed for switching applications, this transistor offers fast switching times, making it suitable for power management and control in various electronic systems.

Minimum DS Breakdown Voltage: 100 V

A high breakdown voltage allows for operation in high-voltage applications, making it a versatile choice for various electronic devices.

Package Shape: RECTANGULAR

The rectangular package shape facilitates easier placement on PCBs and efficient use of space, which is critical in compact designs.

Terminal Form: THROUGH-HOLE

Through-hole mounting provides mechanical stability and better thermal dissipation, making it suitable for high-power applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption in off-state conditions, making it energy-efficient for end-use applications.

Maximum Pulsed Drain Current (IDM): 120 A

The capability to handle high pulsed drain current makes this transistor suitable for demanding applications, such as motor drives and power supplies.

Avalanche Energy Rating (EAS): 100 mJ

A high avalanche energy rating provides robustness against transient conditions, enhancing reliability in power applications.

Maximum Drain Current (Abs): 30 A

The ability to handle a maximum drain current of 30 A allows this FET to be used in high-current applications, providing greater flexibility in design.

No. of Terminals: 3

The three-terminal configuration simplifies circuit design while providing necessary connections for efficient operation.

Maximum Power Dissipation (Abs): 50 W

A high power dissipation rating allows this FET to operate efficiently under higher load conditions without overheating, ensuring longevity.

Package Style (Meter): FLANGE MOUNT

Flange mount design enhances the thermal management of the device, making it ideal for high-power applications where heat dissipation is critical.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology provides superior switching speeds and lower power consumption, making this device suitable for modern electronic applications.

Maximum Operating Temperature: 175 °C

A high operating temperature rating ensures reliability in extreme environments, suitable for automotive and industrial applications.

Transistor Element Material: SILICON

Silicon offers good thermal and electrical properties, ensuring efficient performance and reliability in diverse applications.

Terminal Finish: TIN

Tin terminal finish ensures good solderability, improving assembly reliability and ease of manufacturing.

Maximum Drain Current (ID): 30 A

This specification allows for significant current handling capabilities, making it ideal for power management in various circuits.

Maximum Drain-Source On Resistance: 0.022 ohm

Low on-resistance reduces power loss and improves efficiency in switching operations, making this FET an excellent choice for high-efficiency applications.

Terminal Position: SINGLE

Single terminal position simplifies PCB layout and integration, making it easier to design compact electronic devices.

Case Connection: ISOLATED

Isolated case connection enhances safety and reduces the risk of unwanted short circuits, making it suitable for sensitive applications.

Technical Specifications

Power Field Effect Transistors (FET) STP60NE10FP attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

100 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

30 A

Maximum Drain Current (ID):

30 A

Maximum Drain-Source On Resistance:

.022 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

120 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP60NE10FP Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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