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STF12NM50ND

STMicroelectronics

STF12NM50ND by STMicroelectronics

STF12NM50ND by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a 500V breakdown voltage, 44A max pulsed drain current, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,866 parts In-Stock

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4,866

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Anansix

USA . 1,320 parts In-Stock

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1,320

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Digiode

USA . 1,203 parts In-Stock

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 848 parts In-Stock

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$1.146

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$1.032

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848

$1.146

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$1.032

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MKK Technologies

India . 800 parts In-Stock

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$2.156

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800

$2.156

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DigiPath Technology Company

USA . 800 parts In-Stock

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$2.156

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800

$2.156

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AZTECH Wire

Italy . 528 parts In-Stock

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$13.630

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528

$13.630

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 19,112 parts In-Stock

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Kepictronics

USA . 5,000 parts In-Stock

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Speed Components Ltd (Excess)

Israel . 5,000 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,707 parts In-Stock

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Corphita

USA . 3,341 parts In-Stock

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Perfect Parts

USA . 2,740 parts In-Stock

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2,740

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Parana Technologies

USA . 2,165 parts In-Stock

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$1.371

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$1.371

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Overview

Unlock unparalleled performance with the STF12NM50ND power FET from STMicroelectronics, a trusted leader in semiconductor innovation. Designed for efficient switching applications, this N-channel transistor excels in reliability and delivers exceptional durability, boasting a robust breakdown voltage of 500V. Ideal for various industries, it enhances power management while ensuring your systems run smoothly, providing unmatched value and efficiency in every application. Embrace quality with STMicroelectronics!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy helps in cost-effectiveness, durability, and lightweight characteristics of the transistor.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency, making them ideal for power applications.

Configuration: SINGLE

A single configuration simplifies circuit design and is suitable for applications that require one FET, enhancing compactness.

Transistor Application: SWITCHING

Designed specifically for switching applications, it provides fast response times and efficient performance.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage ensures reliability and prevents failure in high-voltage applications.

Package Shape: RECTANGULAR

A rectangular package shape is convenient for PCB layout, maximizing space efficiency in designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical connections, suitable for high-power applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode transistors require no gate current, making them power-efficient and easy to drive in circuits.

Maximum Pulsed Drain Current (IDM): 44 A

A high pulsed drain current capability allows the transistor to handle transient conditions without failure.

Avalanche Energy Rating (EAS): 350 mJ

A substantial avalanche energy rating permits the transistor to absorb energy spikes, increasing reliability.

Maximum Drain Current (Abs) (ID): 11 A

The rating allows the FET to handle significant continuous currents, essential for power applications.

No. of Terminals: 3

Three terminals simplify connections and integration into various circuit designs.

Maximum Power Dissipation (Abs): 25 W

High power dissipation capability ensures the transistor can handle significant power without overheating.

Package Style (Meter): FLANGE MOUNT

Flange mount style enhances thermal performance through better heat dissipation and mechanical stability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance, making it suitable for digital and analog applications.

Maximum Operating Temperature: 150 °C

A high operating temperature allows for use in demanding environments without compromising performance.

Transistor Element Material: SILICON

Silicon is the standard material for FETs, providing reliability and well-established performance characteristics.

Terminal Finish: MATTE TIN

Matte tin terminal finish prevents solderability issues, ensuring reliable connections in circuits.

Maximum Drain Current (ID): 11 A

A repeat of the continuous current handling capability highlights its suitability for robust power applications.

Maximum Drain-Source On Resistance: 0.38 ohm

Low on-resistance ensures efficient power handling with minimal losses, crucial for energy conservation.

Terminal Position: SINGLE

Single terminal positioning simplifies PCB layout and reduces space requirements, enhancing design efficiency.

Case Connection: ISOLATED

An isolated case connection enhances safety by preventing accidental short circuits and grounding issues.

Technical Specifications

Power Field Effect Transistors (FET) STF12NM50ND attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

350 mJ

Case Connection:

ISOLATED

Configuration:

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

11 A

Maximum Drain Current (ID):

11 A

Maximum Drain-Source On Resistance:

.38 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

44 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STF12NM50ND Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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