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STD12NM50N

STMicroelectronics

STD12NM50N by STMicroelectronics

STD12NM50N by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 500V breakdown voltage, 11A max drain current, and operates at up to 150 °C. Ideal for power management in compact electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Chip Stock

USA . 10,850 parts In-Stock

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10,850

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Vyrian

USA . 4,036 parts In-Stock

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4,036

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Anansix

USA . 1,269 parts In-Stock

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1,269

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Digiode

USA . 512 parts In-Stock

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512

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IDEA Electronic Components Group

UK . 350 parts In-Stock

1+ parts

$0.952

100+ parts

-

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$0.857

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350

$0.952

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$0.857

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MKK Technologies

India . 1,256 parts In-Stock

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$1.791

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$1.791

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DigiPath Technology Company

USA . 1,256 parts In-Stock

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$1.791

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1,256

$1.791

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AZTECH Wire

Italy . 759 parts In-Stock

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$10.650

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759

$10.650

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Component Stockers USA

USA . 342 parts In-Stock

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$99.990

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RC Electronics

USA . 23,583 parts In-Stock

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Kepictronics

USA . 13,000 parts In-Stock

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Perfect Parts

USA . 8,043 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,918 parts In-Stock

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Cyclops Electronics Ltd (Excess)

UK . 5,073 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,942 parts In-Stock

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Parana Technologies

USA . 1,361 parts In-Stock

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$1.138

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Corphita

USA . 452 parts In-Stock

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Assy Fe

Spain . 20 parts In-Stock

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Overview

Unlock unparalleled performance with the STD12NM50N from STMicroelectronics—your go-to choice for reliable power management solutions. Renowned for their superior manufacturing standards, STMicroelectronics guarantees exceptional quality and durability. This N-channel FET excels in switching applications, making it ideal for various electronics, including automotive and industrial systems. Elevate your projects with enhanced efficiency, robust thermal performance, and a commitment to innovation that only ST can provide.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body provides good mechanical strength and thermal stability, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher electron mobility than their P-channel counterparts, resulting in better performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode facilitates efficient flyback operation, making this FET ideal for switching applications where inductive loads are present.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET enhances the efficiency and reliability of electronic circuits.

Surface Mount: YES

The surface mount capability allows for smaller PCB designs and automated assembly processes, reducing production costs.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage ensures reliable operation in high-voltage applications, providing robust protection against voltage spikes.

Package Shape: RECTANGULAR

The rectangular shape aids in efficient space utilization on PCBs, making it easier to position in compact layouts.

Terminal Form: GULL WING

Gull wing terminals provide better contact reliability and are compatible with standard surface mount techniques.

Operating Mode: ENHANCEMENT MODE

Being an enhancement mode FET allows for efficient operation with low gate drive requirements, improving overall system performance.

Maximum Pulsed Drain Current (IDM): 44 A

The ability to handle high pulsed drain currents makes this FET suitable for applications with transient loads.

Avalanche Energy Rating (EAS): 350 mJ

A high avalanche energy rating ensures that the FET can withstand and dissipate maximum energy without failure in harsh conditions.

Maximum Drain Current (Abs) (ID): 11 A

With a maximum drain current of 11 A, this FET is apt for various medium-power applications.

No. of Terminals: 2

The simplicity of having two terminals allows for straightforward integration into circuit designs, maximizing space efficiency.

Maximum Power Dissipation (Abs): 100 W

The high power dissipation capability enables this FET to operate effectively in high-power conditions, enhancing reliability.

Package Style (Meter): SMALL OUTLINE

The small outline package style is ideal for space-constrained applications, facilitating compact design.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance and low power consumption, making this FET highly efficient for modern electronic circuits.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature increases the FET's reliability in demanding environments, broadening its application range.

Transistor Element Material: SILICON

Silicon as the transistor element material is a standard choice that offers good electrical properties and thermal performance.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish enhances solderability, ensuring reliable connections during circuit assembly.

Maximum Drain-Source On Resistance: 0.38 ohm

Low on-resistance improves overall efficiency by minimizing power losses during operation, making this FET energy-efficient.

Terminal Position: SINGLE

A single terminal position simplifies PCB layout and optimizes the use of available space.

Maximum Time At Peak Reflow Temperature (s): 30

This specification ensures compatibility with common soldering processes, enhancing ease of manufacturing.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C indicates robustness against thermal stress during assembly, beneficial for reliability.

Technical Specifications

Power Field Effect Transistors (FET) STD12NM50N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

350 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

11 A

Maximum Drain Current (ID):

11 A

Maximum Drain-Source On Resistance:

.38 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

44 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD12NM50N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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