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STD11NM60N-1

STMicroelectronics

STD11NM60N-1 by STMicroelectronics

STD11NM60N-1 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 600V breakdown voltage, 10A max drain current, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 8,028 parts In-Stock

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Digiode

USA . 2,991 parts In-Stock

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Anansix

USA . 1,683 parts In-Stock

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1,683

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Pegasus Components GmbH

Germany . 44 parts In-Stock

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ComSIT Distribution GmbH

Germany . 30 parts In-Stock

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30

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IDEA Electronic Components Group

UK . 2,175 parts In-Stock

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$1.708

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$1.537

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2,175

$1.708

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$1.537

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MKK Technologies

India . 1,208 parts In-Stock

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$3.211

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$3.211

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DigiPath Technology Company

USA . 1,208 parts In-Stock

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$3.211

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$3.211

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AZTECH Wire

Italy . 994 parts In-Stock

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$11.650

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994

$11.650

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Alle Elektronik GmbH

Germany . 3,988 parts In-Stock

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Corphita

USA . 3,807 parts In-Stock

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Kepictronics

USA . 1,000 parts In-Stock

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Parana Technologies

USA . 252 parts In-Stock

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$2.042

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Overview

Unlock your projects’ full potential with the STD11NM60N-1 from STMicroelectronics, a trusted leader in innovative semiconductor solutions. This robust N-channel power FET excels in switching applications, delivering exceptional performance and reliability under demanding conditions. With its advanced design featuring built-in diode protection and high breakdown voltage, it ensures longevity and efficiency, making it the ideal choice for engineers seeking quality and value in their circuits.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body offers good protection against environmental factors, ensuring durability and reliability of the FET in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally provide better performance, including higher efficiency and faster switching speeds, making them ideal for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for flyback protection, making this FET suitable for use in inductive load applications, enhancing circuit robustness.

Transistor Application: SWITCHING

Designed for switching applications, this FET can efficiently control large currents and voltages, making it ideal for power management systems.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage indicates reliability in high-voltage applications, allowing for safer and more effective operation in power circuits.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient space utilization on PCBs, making it easier to integrate into various designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide strong mechanical support and are easier to solder, ensuring a solid electrical connection in demanding applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower off-state power consumption, making this FET more energy-efficient in active circuits.

Maximum Pulsed Drain Current (IDM): 40 A

A high maximum pulsed drain current rating allows this FET to handle peak currents effectively, making it suited for high-power applications.

Avalanche Energy Rating (EAS): 200 mJ

This rating indicates that the FET can withstand transient energy spikes, enhancing its reliability in rapidly fluctuating environments.

Maximum Drain Current (Abs) (ID): 10 A

The ability to handle up to 10 A ensures that this FET can handle significant current loads, making it ideal for power applications.

No. of Terminals: 3

A simple 3-terminal design facilitates easier circuit integration and reduces complexity in PCB layout.

Maximum Power Dissipation (Abs): 100 W

A high power dissipation rating enables efficient handling of power, allowing for better thermal management in high-performance applications.

Package Style (Meter): IN-LINE

An in-line package style optimizes space in design layouts, making it versatile for a range of electronic uses.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers high switching speeds and low on-resistance, making this product a great choice for high-efficiency power conversion.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature allows for performance in demanding thermal environments, ensuring reliability under varying conditions.

Transistor Element Material: SILICON

Silicon's conductive properties enhance the transistor’s performance and efficiency, making it a common choice for modern electronic circuits.

Terminal Finish: MATTE TIN

The matte tin finish provides enhanced corrosion resistance and improved solderability, contributing to long-lasting connections in electronic assemblies.

Maximum Drain Current (ID): 10 A

Capable of carrying 10 A, this FET can operate effectively in power applications without the risk of failure due to current overload.

Maximum Drain-Source On Resistance: 0.45 ohm

A low on-resistance results in reduced power loss and improved efficiency, making this FET highly suitable for power circuit designs.

Terminal Position: SINGLE

A single terminal position simplifies PCB layout and design, making integration easier and more efficient in circuit designs.

Case Connection: ISOLATED

An isolated case connection enhances safety and reliability, preventing any potential issues with cross-talk or interference in complex circuits.

Technical Specifications

Power Field Effect Transistors (FET) STD11NM60N-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

200 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

10 A

Maximum Drain Current (ID):

10 A

Maximum Drain-Source On Resistance:

.45 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

40 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD11NM60N-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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