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STB16NM50N

STMicroelectronics

STB16NM50N by STMicroelectronics

STB16NM50N from STMicroelectronics is a powerful N-channel FET designed for efficient switching applications. It features a 500V breakdown voltage, 15A max drain current, and operates at up to 150 °C. Ideal for high-performance power management in compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 10,413 parts In-Stock

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Digiode

USA . 3,127 parts In-Stock

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3,127

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Anansix

USA . 1,199 parts In-Stock

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Microfarads

USA . 96 parts In-Stock

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IDEA Electronic Components Group

UK . 1,002 parts In-Stock

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$0.695

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$0.625

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1,002

$0.695

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$0.625

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MKK Technologies

India . 989 parts In-Stock

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$1.306

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989

$1.306

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DigiPath Technology Company

USA . 989 parts In-Stock

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$1.306

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989

$1.306

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AZTECH Wire

Italy . 219 parts In-Stock

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$20.630

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219

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 12,133 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,286 parts In-Stock

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Corphita

USA . 2,542 parts In-Stock

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Parana Technologies

USA . 1,179 parts In-Stock

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$0.830

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1,179

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$0.830

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Overview

Unlock the potential of your designs with the STB16NM50N from STMicroelectronics, a trusted leader in semiconductor innovation. This high-performance N-channel power FET excels in switching applications, delivering exceptional reliability and efficiency. With its robust features, it ensures optimal operation even under demanding conditions. Elevate your projects with superior quality and performance—experience reduced energy costs and enhanced productivity with STMicroelectronics' cutting-edge technology!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy packaging provides durability and resistance to environmental factors, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient than P-channel devices, offering higher speed and lower on-resistance, making them suitable for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

This configuration simplifies circuit design by integrating a built-in diode, allowing for fast switching and protecting against reverse voltage.

Transistor Application: SWITCHING

Designed for switching applications, this FET is ideal for power management and control circuits, effectively handling high-speed operations.

Surface Mount: YES

Surface mount technology allows for smaller PCBs and automated assembly, enhancing production efficiency and making this FET suitable for compact designs.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage enhances the reliability of the FET in high-voltage applications, ensuring it can handle significant electrical stress without failure.

Package Shape: RECTANGULAR

The rectangular package shape contributes to efficient space utilization on the PCB, allowing for better layout options in compact designs.

Terminal Form: GULL WING

Gull-wing terminals provide good mechanical strength and ease of soldering, ensuring secure connections on PCBs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows the FET to have low leakage current when off, which improves energy efficiency and reduces power loss.

Maximum Pulsed Drain Current (IDM): 60 A

A high maximum pulsed drain current capacity makes this FET suitable for applications requiring brief but high current surges.

Avalanche Energy Rating (EAS): 470 mJ

The ability to handle significant avalanche energy enhances reliability in applications prone to voltage transients.

Maximum Drain Current (Abs) (ID): 15 A

This maximum continuous drain current rating ensures reliable operation in a wide range of applications, supporting substantial power delivery.

No. of Terminals: 2

A simple two-terminal configuration facilitates easy integration into various circuit designs, simplifying the layout process.

Maximum Power Dissipation (Abs): 125 W

A high maximum power dissipation rating allows the FET to handle significant power levels without overheating, enhancing system robustness.

Package Style (Meter): SMALL OUTLINE

The small outline package style promotes compactness, enabling designs to save space while maintaining performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides superior switching speeds and reduced on-resistance, ideal for high-speed and low-power applications.

Maximum Operating Temperature: 150 °C

The ability to operate at high temperatures ensures reliability in demanding environments and extended operational life.

Transistor Element Material: SILICON

Silicon is a standard material that offers excellent electrical characteristics, making this FET a reliable choice for various applications.

Terminal Finish: MATTE TIN

Matte tin finish helps in preventing oxidation and ensures reliable soldering connections, enhancing overall device longevity.

Maximum Drain Current (ID): 15 A

The repeated specification for maximum drain current reinforces its importance in ensuring efficient and reliable circuit operation.

Maximum Drain-Source On Resistance: 0.26 ohm

A low on-resistance minimizes power loss and heat generation during operation, improving overall efficiency in circuit designs.

Terminal Position: SINGLE

Single terminal position simplifies mounting and connection in circuit layouts, offering enhanced flexibility in design.

Technical Specifications

Power Field Effect Transistors (FET) STB16NM50N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

470 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

15 A

Maximum Drain Current (ID):

15 A

Maximum Drain-Source On Resistance:

.26 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

60 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB16NM50N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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