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STB13NM50N

STMicroelectronics

STB13NM50N by STMicroelectronics

STB13NM50N by STMicroelectronics is an N-channel MOSFET ideal for switching applications. It features a 500V breakdown voltage, 12A max drain current, and operates at up to 150 °C. This compact FET ensures efficient power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (In-Stock)

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Digiode

USA . 4,003 parts In-Stock

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4,003

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Vyrian

USA . 3,599 parts In-Stock

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3,599

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Anansix

USA . 2,343 parts In-Stock

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2,343

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MISTER SPROCKETS

USA . 1,400 parts In-Stock

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1,400

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Lakeland Logistics Inc

USA . 674 parts In-Stock

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674

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Bristol Electronics

USA . 674 parts In-Stock

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674

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IDEA Electronic Components Group

UK . 885 parts In-Stock

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$1.282

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$1.154

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885

$1.282

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$1.154

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MKK Technologies

India . 12 parts In-Stock

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$2.412

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12

$2.412

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DigiPath Technology Company

USA . 12 parts In-Stock

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$2.412

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12

$2.412

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AZTECH Wire

Italy . 778 parts In-Stock

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$21.520

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$21.520

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Component Stockers USA

USA . 599 parts In-Stock

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$99.990

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599

$99.990

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Corphita

USA . 3,637 parts In-Stock

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3,637

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Alle Elektronik GmbH

Germany . 3,036 parts In-Stock

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Parana Technologies

USA . 808 parts In-Stock

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$1.533

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$1.533

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Overview

Elevate your designs with the STB13NM50N from STMicroelectronics—a trusted leader in innovative semiconductor solutions. This robust N-channel power FET delivers exceptional performance for switching applications, ensuring reliability and efficiency. With its superior breakdown voltage and built-in diode, it excels in demanding environments, making it ideal for industrial automation, power supplies, and renewable energy systems. Experience unmatched quality and value with STMicroelectronics!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material offers durability and protection against environmental factors, ensuring long-term reliability.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their high efficiency and better switching characteristics, making them suitable for high-speed applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional functionality and protection, simplifying the circuit design and enhancing reliability.

Transistor Application: SWITCHING

Optimized for switching applications, this FET can effectively control power in various electronic circuits.

Surface Mount: YES

Surface mount technology allows for compact designs and efficient use of PCB space, making it ideal for modern electronics.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage ensures the transistor can operate effectively in high-voltage applications, providing versatility.

Package Shape: RECTANGULAR

Rectangular packaging facilitates easy integration into a variety of circuit layouts, enhancing design flexibility.

Terminal Form: GULL WING

Gull wing terminals provide excellent surface contact for reliable soldering, enhancing the overall performance of the device.

Operating Mode: ENHANCEMENT MODE

Enhancement mode means the FET turns on fully when a suitable gate voltage is applied, facilitating efficient control of current flow.

Maximum Pulsed Drain Current (IDM): 48 A

A high pulsed drain current capability allows the FET to handle surge conditions, improving its durability in demanding applications.

Avalanche Energy Rating (EAS): 200 mJ

A high avalanche energy rating indicates robustness against voltage spikes, enhancing the reliability of the circuit.

Maximum Drain Current (Abs) (ID): 12 A

This level of maximum drain current allows for effective operation in various electronic applications, ensuring optimal performance.

No. of Terminals: 2

A simple two-terminal design minimizes complexity in circuit design, making it easier for integration.

Maximum Power Dissipation (Abs): 100 W

High power dissipation capacity enables the FET to handle substantial power loads, ideal for robust applications.

Package Style (Meter): SMALL OUTLINE

A small outline package supports high-density mounting on PCBs, essential for space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this FET efficient for a wide range of applications.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature allows the FET to perform reliably in harsh environments and during intensive operations.

Transistor Element Material: SILICON

Silicon as a semiconductor material offers good thermal stability, enhancing performance and longevity of the device.

Terminal Finish: MATTE TIN

Matte tin finish enhances solderability and corrosion resistance, ensuring reliable connections on PCBs.

Maximum Drain Current (ID): 12 A

This feature ensures the transistor can effectively manage substantial current levels, making it suitable for power applications.

Maximum Drain-Source On Resistance: 0.32 ohm

Low on-resistance means reduced power loss and heat generation during operation, improving overall efficiency.

Terminal Position: SINGLE

Single terminal positioning allows for easier mounting and simplifies PCB layout, enhancing manufacturability.

Technical Specifications

Power Field Effect Transistors (FET) STB13NM50N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

200 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.32 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

48 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB13NM50N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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